采用常压化学气相沉积法(APCVD),以有机金属化合物-单丁三氯化锡(C4H9SnCl3,MBTC)和三氟乙烯(CF3COOH,TFA)为前驱物和掺杂剂,以水为催化剂,在线制备了F掺杂的SnO2膜;采用XRD、SEM、椭偏仪等方法研究催化剂H2O的用量对薄膜的结构和光电性能的影响.结果表明,H2O可促进反应混合气体在基板表面的热分解反应,加速薄膜沉积速率,提高薄膜结晶性能.
F-doped tin oxide (Sn:F) film was prepared by atmosphere pressure chemical vapor deposition (APCVD) on float glass using monobutyltin trichloride (C4H9SnCl3, MBTC) and trifluoro acetic acid (CF3COOH, TFA) as the precursor and dopant, respectively. Different concentrations of H2O were used as the activator. The prepared films were characterized by means of XRD, SEM, and UV-VIS-NIR spectroscopy. Experimental results reveal that the structures and properties of the films are greatly affected by the H2O content. Water in a certain range of concentrations will promote the formation of SN: F film and improve the properties of the films.
参考文献
| [1] | McCurdy R J .[J].Thin Solid Films,1999,351(1-2):66. |
| [2] | Schaefer C;Brauer G;Szczyrbowski J .[J].Surface and Coatings Technology,1997,93(01):37. |
| [3] | Gordon R .Chemical vapor deposition of coatings on glass[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1997(0):81-91. |
| [4] | Thangaraju B. .Structural and electrical studies on highly conducting spray deposited fluorine and antimony doped SnO2 thin films from SnCl2 precursor[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):71-78. |
| [5] | Soliman M;Hussein M M;S El-Atawy et al.[J].Renewable Energy,2001,23(3-4):463. |
| [6] | Ruske M;Brauer G;Szczyrbowski J .[J].Thin Solid Films,1999,351(1-2):146. |
| [7] | 郭玉忠,王剑华,黄瑞安,王贵青.掺杂SnO2透明导电薄膜电学及光学性能研究[J].无机材料学报,2002(01):131-138. |
| [8] | Kalbskopf R .[J].Thin Solid Films,1981,77(1-3):65. |
| [9] | van Mol AMB;Chae Y;McDaniel AH;Allendorf MD .Chemical vapor deposition of tin oxide: Fundamentals and applications[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):72-78. |
| [10] | Lefthedotis G;Papaefthimiou S;Yianoulis P .[J].Solid State Ionics,2000,136-137(02):655. |
| [11] | Jain Garima;Kumar R .[J].Optical Materials,2004,26(01):27. |
| [12] | Elangovan E;Ramamurthi K .[J].Applied Surface Science,2005,249(1-4):183. |
| [13] | Aukkaravittayapun S;Wongtida N;Kasecwatin T;Charojrochkul S;Unnanon K;Chindaudom P .Large scale F-doped SnO2 coating on glass by spray pyrolysis[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1):117-120. |
| [14] | Del Re M;Gouttebaron R;Dauchot JP;Hecq M .Study of the optical properties of AlN/ZrN/AIN low-e coating[J].Surface & Coatings Technology,2004(0):488-495. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%