采用交流窄脉冲微弧氧化法于Na2SiO3-KOH-(NaPO3)6溶液中在Ti6A14V表面形成了陶瓷化涂层.用常压氧化方式(U=500 V),研究了正脉冲占空比对涂层生长速率、组织形貌和相组成的影响.为优化工艺,采用常流氧化方式(J=60 mA/cm2),并提出了占空比分级调节制度.结果表明:常压方式下,随正脉冲占空比的增大,涂层的生长速率增加,涂层的表面逐渐变得粗糙.涂层主要由TiO2(锐钛矿相及金红石相)相组成,随占空比的增大,涂层中锐钛矿相TiO2的相对含量减小,金红石相TiO2的相对含量增加,并成为主晶相.正脉冲占空比为8%时可获得组织结构较致密且较厚的涂层.采用常流氧化方式,涂层的生长速率比常压方式明显增加,进而对占空比进行分级式调节可使涂层的表面结构得到改善.
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