THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

金属学报(英文版), 2000, 13(6): 1131-1135.

THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

X. Y. Jiang , H.B. Xu and S.K. Gong (Department of Materials Science and Engineering , Beijing University of Aeronautics and Astronautics , Beijing 100083 , China)

Keywords： amorphous NiTi film , null , null

The crystallization kinetics of an amorphous Ti-rich NiTi film (Ni 46.34at.%, Ti 53.66at.%)prepared by DC magnetron sputtering was determined by non-isothermal techniques. The activation energy of crystallization and the mean value of the Avrami parameter are 382kJ/mol and 0.85, respectively. The calculated isothermal kinetic curse of amorphous film at 773K coincides with the result of X-ray diffraction.The formation of a Ti2Ni phase is accompanied with the crystallization of Ti-rich NiTi film.

参考文献

[1]
[2]
[3]
[4]

上一张下一张

PDF下载
导出引用
下载XML
收藏文章

计量

下载量()
访问量()

作者相关

在本站搜索
X. Y. Jiang H.B. Xu and S.K. Gong (Department of Materials Science and Engineering Beijing University of Aeronautics and Astronautics Beijing 100083 China)
在百度学术搜索
X. Y. Jiang H.B. Xu and S.K. Gong (Department of Materials Science and Engineering Beijing University of Aeronautics and Astronautics Beijing 100083 China)
在万方数据库搜索
X. Y. Jiang H.B. Xu and S.K. Gong (Department of Materials Science and Engineering Beijing University of Aeronautics and Astronautics Beijing 100083 China)
在CNKI搜索
X. Y. Jiang H.B. Xu and S.K. Gong (Department of Materials Science and Engineering Beijing University of Aeronautics and Astronautics Beijing 100083 China)

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

参考文献