制备性能优良、高度择优取向或外延生长、成分均匀、结构可控的晶态铁电薄膜材料,是发展铁电薄膜应用的基础.随着铁电薄膜在微电子学,光电子学和集成光学等领域的应用不断扩大,如何制备高性能的铁电薄膜材料一直称为人们关注的热点.对择优取向铁电薄膜材料制备技术中的主要影响因素进行了分析,希望能为从事此方面工作的研究者提供一定的借鉴.
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