控制工艺参数，用直流等离于化学气相沉积（DCPCVD）装置，对碳钢、合金结构钢、高速钢等沉积Si3N4非晶态薄膜，并研究了薄膜的成分、结构、形貌及硬度
Si3N4 thin film has been deposited on the matrixes of carbon steels, alloy structure steels, speed steels and stainless steels by using a direct current plasma chemical vapor deposition (DC-PCVD) device under controlling processing parameters. Component,structure, morphology and hardness of the film were measured. This thin film consists mainly of the component of Si3N4 with amorphous structure.
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