采用弧辉等离子沉积工艺在镁合金AZ91表面涂覆了TiN薄膜.研究了沉积温度对膜层的厚度、结合力及硬度的影响.用扫描电镜(SEM)、X射线衍射(XRD)和辉光放电光谱(GDS)分析了涂层的成分和微观结构.结果表明,随着控制温度的升高,膜层厚度呈缓慢增加的趋势,但温度过高或过低结合力明显下降,以160～180℃最佳.180℃时的硬度HK0.01最高,达14 630 MPa.
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