采用紫外线光刻技术与电化学沉积相结合的方法,成功制备了不同图案的铜纳米线阵列:一种是圆形图案;另一种是QDU图案.首先利用紫外线光刻技术在多孔阳极氧化铝模板(AAO)生成预设图案,以此作为"二次模板";再利用电化学方法将铜纳米线沉积到"二次模板"的开孔中.扫描电镜(SEM)测试结果表明,大面积、高规整的铜纳米线图案阵列各自独立地立在基底上, 同时,用电子能谱(EDS)分析了铜纳米线的化学成分.透射电镜(TEM)也探测到了铜纳米线的微结构.
Two different patterns, one being circular and the other being QDU, of copper (Cu) nanowire arrays were successfully produced with designed anodic aluminum oxide (AAO) templates. AAO template was first patterned using photolithography, and then Cu nanowires were electrochemically deposited into the open pores in desired area of the patterned template. The highly-ordered patterns of Cu nanowire arrays were observed to stand freely on the substrate using scanning electron microscopy (SEM). Chemical analyses have been performed on Cu nanowires using energy dispersive X-ray spectroscopy (EDS). The structure and microstructure of an individual Cu nanowire were characterized by translation electron microscopy (TEM). The relationship between deposition time and length of wires is discussed.
参考文献
| [1] | Li F;Zhu M;Liu C G et al.[J].American Chemical Society,2006,128:13342. |
| [2] | Gates B D;Xu Q B;Stewart M et al.[J].Chemical Reviews,2005,105:1171. |
| [3] | Rothschild M .[J].Materials Today,2005,18:10. |
| [4] | Babak Z .[J].Langmuir,2004,21:20. |
| [5] | Elsner H;Meyer H G .[J].Microelectronic Engineering,2001,291:57. |
| [6] | Yamazaki K;Namatsu H .[J].Microelectronic Engineering,2004,85:73. |
| [7] | Denoual M;Griscom L;Toshiyoshi H;Fujita H .Accurate double-height micromolding method for three-dimensional PolyDiMethylSiloxane structures[J].Japanese journal of applied physics,2003(7a):4598-4601. |
| [8] | Goetting L B;Deng T;Whitesides G M .[J].Langmuir,1999,15:1182. |
| [9] | Schmid H.;Michel B. .Siloxane polymers for high-resolution, high-accuracy soft lithography[J].Macromolecules,2000(8):3042-3049. |
| [10] | John P M S;Craighead H G .[J].Applied Physics Letters,1996,68:1022. |
| [11] | Gy(o)rvary E S .[J].Nano Letters,2003,3:315. |
| [12] | Kuwabara K;Ogino M;Motowaki S et al.[J].Microelectronic Engineering,2004,752:73. |
| [13] | Christman KL;Requa MV;Enriquez-Rios VD;Ward SC;Bradley KA;Turner KL;Maynard HD .Submicron streptavidin patterns for protein assembly[J].Langmuir: The ACS Journal of Surfaces and Colloids,2006(17):7444-7450. |
| [14] | Lee H;Dellatore S M;Miller W M et al.[J].Science,2007,318:426. |
| [15] | Wallraff G.M.;Hinsberg W.D. .Lithographic lmaging Techniques for the Formation of Nanoscopic Features[J].Chemical Reviews,1999(6):1801-1821. |
| [16] | Gy(o)rvary E S;O'Riordan A;Quinn A J et al.[J].Nano Letters,2003,3:315. |
| [17] | Inguanta R;Piazza S;Sunseri C .Novel procedure for the template synthesis of metal nanostructures[J].Electrochemistry communications,2008(4):506-509. |
| [18] | Gao T;Meng G W;Zhang J et al.[J].Applied Physics A:Materials Science and Processing,2001,73:251. |
| [19] | Inguanta R;Piazza S;Sunseri C .[P].It Pat:2007.VI-2007-A000275 |
| [20] | Del Campo A;Arzt E .[J].Chemical Reviews,2008,108:911. |
| [21] | Sui YC.;Cui BZ.;Martinez L.;Perez R.;Sellmyer DJ. .Pore structure, barrier layer topography and matrix alumina structure of porous anodic alumina film[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):64-69. |
| [22] | Li X R;Song G J;Peng Z et al.[J].Nanoscle Res Lett,2008,3:521. |
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