沉积温度对三倍频ZrO2薄膜能隙的影响

材料导报, 2004, 18(z3): 119-121.

基金项目: 国家高技术研究发展计划(863计划)

Effect of Deposition Temperature on the Optical Energy Gap of 3w ZrO2 Films

采用电子束蒸发沉积制备了不同基底温度的ZrO2单层薄膜.计算了薄膜在三倍频处的折射率、消光系数,分析了基底温度对薄膜带隙的影响及薄膜性质与损伤阈值的关系,得出了薄膜能隙随温度升高而降低,薄膜在三倍频处的损伤阈值与能隙成正比关系,这与薄膜损伤机理-多光子吸收、雪崩电离机理相符.

[1]	Ritter E et al.[J].Applied Optics,1976,15(10):2318.
[2]	Ritala M;Leskela M .[J].Applied Surface Science,1994,75(03):333.
[3]	Thielsch R.;Gatto A.;Heber J.;Kaiser N. .A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):86-93.
[4]	吴启宏 .薄膜的光学特性测量[D].浙江大学光学仪器工程系,1986.
[5]	Sahoo N K;Thakur S;Senthilkumar M et al.[J].Thin Solid Films,2003,440:155.
[6]	黄昆.固体物理学[M].北京:高等教育出版社,1980

上一张下一张

计量

作者相关

文章评分