采用硫酸盐镀液体系,在紫铜箔上电沉积制备了Fe-Ni合金镀层,研究了镀液成分(如镀液中添加剂含量.Ni2+/Fe2+浓度比)及主要的沉积工艺参数(包括阴极电流密度、温度和搅拌速率)对镀层表面质量、成分及组织的影响.镀液成分及最佳工艺参数为:0.3 mol/L NiSO4·6H2O,0.08 mol/L FeSO4·7H2O,2g/L糖精,0.35 g/L 1,4-丁炔二醇,电流密度3.7 A/dm2,施镀温度40℃,搅拌速率200 r/min.
参考文献
[1] | HARNER L L .INVAR at 100 years[J].Advanced Materials and Processes,1997,151(05):31-34. |
[2] | SAITO H.Physics and Applications of Invar Alloys[M].Tokyo:Maruzen Company Ltd,1978 |
[3] | 陶志刚.低膨胀合金的应用前景[J].首钢科技,1994(04):46-48. |
[4] | 邓姝皓,龚竹青,陈文汩.电沉积纳米晶体材料的研究现状与发展[J].电镀与涂饰,2001(04):35-39,50. |
[5] | IWASE K;NASU N .X-ray study on the electrolytic Fe-Ni alloys[J].Bulletin of the Chemical Society of Japan,1932,7(09):305-314. |
[6] | S. E. Hadian;D. R. Gabe .Residual stresses in electrodeposits of nickel and nickel-iron alloys[J].Surface & Coatings Technology,1999(2/3):118-135. |
[7] | Yonghua Zhang;Guifu Ding;Hong Wang;Shi Fu;Bingchu Cai .Low-Stress Permalloy for Magnetic MEMS Switches[J].IEEE Transactions on Magnetics,2006(1):51-55. |
[8] | Fricoteaux P;Rousse C .Influence of substrate, pH and magnetic field onto composition and current efficiency of electrodeposited Ni-Fe alloys[J].Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry,2008(1):9-14. |
[9] | 郭占成,刘宇星,刘美凤,卢维昌.电沉积Fe、Ni基合金箔的组织形貌及磁性能[J].中国有色金属学报,2004(02):273-279. |
[10] | Li HQ.;Ebrahimi F. .Synthesis and characterization of electrodeposited nanocrystalline nickel-iron alloys[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2003(1/2):93-101. |
[11] | 罗北平,龚竹青,郑雅杰,杨余芳,陈梦君.因瓦合金箔电沉积的制备及其微观结构和耐蚀性[J].中南大学学报(自然科学版),2006(02):263-268. |
[12] | 龚竹青,罗北平,杨余芳,陈梦君.因瓦合金箔电沉积工艺的研究[J].材料导报,2004(12):91-94. |
[13] | Kim SH;Sohn HJ;Joo YC;Kim YW;Yim TH;Lee HY;Kang T .Effect of saccharin addition on the microstructure of electrodeposited Fe-36 wt.% Ni alloy[J].Surface & Coatings Technology,2005(1):43-48. |
[14] | 蒋艳平,潘勇,周益春.电沉积镍涂层中的残余应力及激光热冲击的影响[J].湘潭大学自然科学学报,2004(01):49-54. |
[15] | 周英杰;满红娜 .也镀层内应力的产生和消除办法[J].涂料涂装与电镀,2005,3(03):13-16. |
[16] | 曾华梁;吴仲达;陈钧武.电镀工艺手册[M].北京:机械工业出版社,1997:189-205. |
[17] | 方景礼.电镀添加剂理论与应用[M].北京:国防工业出版社,2006:87-88. |
[18] | HORKANS J .On the role of buffers and anions in NiFe electrodeposition[J].Journal of the Electrochemical Society,1979,126(11):1861-1867. |
[19] | HORKANS J .Effect of plating parameters on electrodeposited NiFe[J].Journal of the Electrochemical Society,1981,128(01):45-49. |
[20] | 黄子勋;吴纯素.电镀理论[M].北京:中国农业机械出版社,1982:76. |
[21] | DOKANIA A K;KOCDEMIR B;DIEBOLDER R et al.a to γ phase transformation in electrodeposited Invar film by short pulse laser treatment[J].Materials Science and Engineering A,2007,456(1/2):64-71. |
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