利用基于紧束缚势(TB)的分子模拟方法研究了硅中90度部分位错双周期(DP)结构的运动特性.详尽描述了该结构的左弯结和右弯结在一个周期内的运动过程.利用共轭梯度(conjugate gradients:CG)法计算得到了DP结构中左、右弯结的形成能.另外,在弯结运动过程的基础上,利用NEB(nudged elastic band)方法计算出了左、右弯结在一个运动周期内的迁移势垒,并且发现Si中90度部分位错的运动主要受弯结迁移势垒的控制.最后,根据位错运动的活化能理论分别得到了决定90度部分位错运动的长位错段和短位错段的活化能.
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