通过调整镀层厚度得到了具有不同孔隙率的Ni-P化学镀层.使用图形分析软件辅助贴滤纸法测得了镀层孔隙率,并研究了孔隙率对镀层电化学行为的影响,探讨了利用电化学测试对镀层孔隙率进行量化评价的方法.结果表明,图形分析软件可以提高贴滤纸法的准确性和可重复性,而电化学方法在测量镀层微小孔隙方面具有明显优势.极化曲线测试表明,孔隙率较小的镀层具有较高的腐蚀电位和较低的腐蚀电流密度,可根据所测曲线精确计算出镀层孔隙率.交流阻抗测试可进一步揭示孔隙率对镀层腐蚀机理的影响,存在孔隙的镀层其交流阻抗谱会表现双时间常数的特征,通过拟合所得电化学参数可以用来评价镀层孔隙率大小.
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