陶瓷绝缘子沿面闪络是制约电真空器件绝缘性能、影响设备正常运行的关键因素之一.本文介绍了关于真空中陶瓷绝缘子沿面闪络物理机制的各种假说,着重阐述了二次电子发射雪崩理论,分析了影响陶瓷绝缘子闪络电压的各种因素,提出了从陶瓷材料角度提高闪络电压的方向,总结了绝缘子沿面闪络现象的研究现状,展望了今后的研究方向与发展趋势.
参考文献
| [1] | Miller H C .[J].IEEE Transactions on Information Theory,1993,28:512. |
| [2] | Anderson R A.Proc XIV Int Sym Disch Electr Insul Vac[C].Santa Fe,1990:311. |
| [3] | Suzuki T .[J].Japanese Journal of Applied Physics,1974,13:1541. |
| [4] | Blaise G;Gressus C Le .[J].Journal of Applied Physics,1991,69(09):6334. |
| [5] | Xu N S et al.[J].IEEE Transactions on Plasma Science,1997,25(03):447. |
| [6] | YAMAMOTO O;Hara T et al.[J].IEEE Electron Device Letters,1989,24:991. |
| [7] | Pillai A S;Hackam R .[J].Journal of Applied Physics,1985,58:146. |
| [8] | Cross J D;Mazurek B .[J].IEEE Electron Device Letters,1988,23:43. |
| [9] | Chalmers I D;Lei J H;Bethel J W.Proc XIV Int Sym Disch Electr Insul Vac[C].Santa Fe,1990:324. |
| [10] | Vogtlin G E.Proc XIV Int Sym Disch Electr Insul Vac[C].Santa Fe,1990:307. |
| [11] | Khamidov N;Agzamov A et al.[J].Zes Nauk Poli Poznan Elektryka,1989,38:221. |
| [12] | Pillai A S;Hackam R .[J].Journal of Applied Physics,1987,61:4992. |
| [13] | Kotov Y A;Rodionov N E et al.[J].Instruments and Experimental Techniques,1986,29:415. |
| [14] | Bommakanti R G;Sudarshan T S .[J].Journal of Applied Physics,1990,67:6991. |
| [15] | Brettschneider H .[J].IEEE Electron Device Letters,1988,23:33. |
| [16] | Miller H C;Furno E J .[J].Journal of Applied Physics,1978,49:5416. |
| [17] | Jaitly N C et al.[J].IEEE Electron Device Letters,1987,22:447. |
| [18] | Bommakanti R G;Sudarshan T S .[J].Journal of Applied Physics,1989,66(05):2091. |
| [19] | Chalmers I D et al.[J].IEEE Electron Device Letters,1995,2(02):225. |
| [20] | Enloe C L .[J].Journal of Applied Physics,1989,65(09):3329. |
| [21] | Asokan T;Sudarshan T S .[J].IEEE Electron Device Letters,1994,1(06):1180. |
| [22] | Tumiran et al.[J].IEEE Electron Device Letters,1997,4(04):400. |
| [23] | Sudarshan T S;Li C R .[J].IEEE Electron Device Letters,1997,4(05):657. |
| [24] | Blaise G .[J].IEEE Electron Device Letters,1993,28(04):437. |
| [25] | Asokan T;Sudarshan T S .[J].IEEE Electron Device Letters,1993,28(02):192. |
| [26] | Coaker B M;Xu N S;Latham R V .[J].IEEE Electron Device Letters,1995,2(02):210. |
| [27] | Hatfield L L .[J].IEEE Electron Device Letters,1997,24(06):985. |
| [28] | 丁立健,李成榕.真空中绝缘子的沿面闪络现象[J].高电压技术,1999(02):53-57. |
| [29] | 丁立健,李成榕,王景春,王伟,程养春.真空中绝缘子沿面预闪络现象的研究[J].中国电机工程学报,2001(09):27-32. |
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