研究了纳米金刚石粉预处理的光滑硅衬底上CVD金刚石薄膜的成核与生长．通过与研磨处理样品相比较，纳米金刚石的预处理极大地提高了成核密度（可达109／cm2）、成核速度与成膜质量，并能方便地进行成核密度的控制，是一种经济实用、简单有效的预处理方法．
Ultradispersed nanodiamond powder synthesized by explosive detonation was used for the pretreatment of mirror Si substrate for nucleation and growth of diamond by microwave plasma-CVD. Compared with the scratching pretreatment,
it is found that the pretreatment method by coating substrate with the slurry loading nanodiamond powder not only enhances both of density (up to 109 cm-2
and nucleation rate, improving the quality of grown-up film greatly, but also controls nucleation easily. In addition, this pretreatment is also very
cost-effective, non-damaging, and reproducible as well.
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