采用非平衡磁控溅射法在血管支架上制备Ti-O薄膜、重点研究了支架表面薄膜厚度、内外表面薄膜差异及两种变形方式下薄膜的力学性能.支架表面积用精密MES电子天平称得质量计算得到,薄膜厚度通过薄膜质量与支架表面积的关系求得;用X-射线电子能谱(EDX)分析了支架内外表面薄膜成份及含量;对支架压缩、撑开并选取变形量大、应力集中单元筋进行研究,用扫描电子显微镜(SEM)观察薄膜是否有破坏.结果表明,在该工艺下支架表面薄膜平均厚度为9.98nm,支架内外表面薄颜色泽均匀,薄膜附着性良好,在支架压缩和撑开过程中,应力大的单元筋表面没有观察到薄膜的开裂、剥落,薄膜的力学性能可靠.
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