用离子束辅助沉积(IBAD)技术合成氮化硼薄膜,红外吸收谱和透射电镜的观测结果显示,薄膜含有c—BN和h—BN相薄膜Knoop硬度值高达35GPa。逐层剥离的AES谱结果表明,薄膜表面存在氮离子的注入效应,薄膜由注入层、成分均匀层和离子束混合过渡层组成
BN films, synthesized by ion beam assisted deposition, were analysed by RBS,AES, IR spectra and TEM. Formation of c-BN phase was shown not only by IR spectra atabsorption peak of 1100 cm~(-1), but also by electron diffraction pattern. The results of AESdemonstrate an effect of N~+ implantation near the film surface. The deposited films consist ofthree layers, i.e., ion implantation layer, film layer and mixed intermediate layer, according tothe difference of concentration. The micro-Knoop hardess of the film is 25-35 GPa.
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