用电子探针、透射电镜以及能谱分析观测了经(NH_4)_2MoS_4溶液二次阳极电解沉积润滑剂处理的硫酸膜,磷酸膜和草酸膜中的沉积产物和膜结构。沉积产物由S与Mo的化合物构成,并非单一的MoS_2;在靠近膜表层部分沉积产物较多,膜中存在规则的无阻挡层的大孔;磷酸膜阻挡层中存在有规则的与原阳极氧化膜结构单元参数无关的细小通道。Ar气保护下加热时,膜中的硫可以硫化钼的形式保留在膜中。
Observations were carried out of the structure of sulphuric, oxalic or phosphoric films on AI after treatment of reanodizing and electrolytic depositing lubricant in (NH_4)_2MoS_4 solution, as well as of the deposited products by means of EMPA, TEM and energy spectroscopic analysis. The deposited products are compounds of S and Mo other than single MoS_2, and most of them deposited near the surface layer of the film. Some regular long pores without barrier layer occurred in the film, but the regular fine channels without relation to the structural element parameters of original anodized film were found in the thickened barrier layer of phosphoric film. Sulphur may be remained as molybdenum sulphide in the film during heating under Ar protective environment.
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