在纯钼表面进行包埋Si-B共渗,研究B改性MoSi2涂层的结构及其在600℃下的氧化行为.利用XRD,EDS,WDS分析涂层的相组成和结构,并结合热力学计算分析涂层的组织形成.结果表明:采用16Si-4B-4NaF-76Al2O3渗剂在1100 ～ 1400℃下可制备Si-B共渗涂层,涂层由外向内可分为五层:最外层MoSi2,次外层MoSi2+MoB,第三层Mo5Si3,第四层MoB和最内层Mo2B;涂层主体为MoSi2,渗入的B在与基体反应形成Mo-B化合物层的同时,还在MoSi2中形成MoB相;涂层的生长以Si,B原子向内扩散为主;在600℃氧化时涂层中的B向表面扩散并氧化生成B2O3.
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