GaN基LED衬底材料化学机械抛光研究进展

表面技术 , 2014, 43(1): 125-130.

GaN基LED衬底材料化学机械抛光研究进展

熊伟 ^1, , 储向峰 ^2, , 白林山 ^3, , 董永平 ^4, , 叶明富 ^5,

1.安徽工业大学化学化工学院,安徽马鞍山243002

2.安徽工业大学化学化工学院,安徽马鞍山243002

3.安徽工业大学化学化工学院,安徽马鞍山243002

4.安徽工业大学化学化工学院,安徽马鞍山243002

5.安徽工业大学化学化工学院,安徽马鞍山243002

基金项目: 安徽工业大学研究生创新基金(2012029) Graduate Innovation Fund of AHUT(2012029)

关键词：衬底材料 , 化学机械抛光 , 抛光工艺 , 抛光浆料

Research Progress of Chemical Mechanical Polishing of Substrates Used in GaN-based LED

XIONG Wei ^1, , CHU Xiang-feng ^2, , BAI Lin-shan ^3, , DONG Yong-ping ^4, , YE Ming-fu ^5,

1.安徽工业大学化学化工学院,安徽马鞍山243002

2.安徽工业大学化学化工学院,安徽马鞍山243002

3.安徽工业大学化学化工学院,安徽马鞍山243002

4.安徽工业大学化学化工学院,安徽马鞍山243002

5.安徽工业大学化学化工学院,安徽马鞍山243002

Keywords： substrate materials , chemical mechanical polishing , polishing process , polishing slurry

概述了化学机械抛光作用机制,着重阐述了3种常见衬底(α-Al2O3,SiC,Si)的化学机械抛光现状,主要从抛光工艺参数和抛光液组成(不同磨料、磨料粒径、氧化剂、络合剂、pH值等)对晶片抛光效果的影响展开研究,并指出了目前化学机械抛光存在的问题,进一步展望了LED衬底化学机械抛光的发展前景.

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材料期刊网

GaN基LED衬底材料化学机械抛光研究进展

Research Progress of Chemical Mechanical Polishing of Substrates Used in GaN-based LED

参考文献