Shanling WANG
,
Baoluo SHEN Shengji GAO
,
Da LI
,
Mingjing TU
,
Weicheng YU
,
Ge YAO
材料科学技术(英文)
The creep behavior of Al2O3. SiO2 fiber reinforced ZL109 composites has been investigated at four temperatures ranging from 553 to 623 K. The results show high stress exponent and high apparent creep activation energy. A good correlation between the normalized creep rate and normalized effective stress means that the true stress exponent of minimum creep strain rate of the composite is very close to 5, and the minimum creep strain rate is matrix lattice diffusion controlled. The threshold stress decreases with increasing temperature linearly and disappears at a temperature close to 623 K. It is assumed that the long range internal back stresses generated in creep reduce the load transfer to fibers and the interaction between dislocations and strengthening precipitates decreases at high temperature. At a high temperature where the long range internal back stresses is very close to the applied stress, the threshold stress disappears.
关键词:
LIU Shuqi
,
YI Tao
,
Peking University
,
Beijing
,
China
金属学报(英文版)
The diagram of Ag-Cu-Ge system was constructed from the investigation of 13 internal sec- tions by DTA heating as well as cooling curves in an atomsphere of dry N_2 . The phase dia- gram is subdivided into two pseudo-ternary systems shown as Ag-Cu-Cu_3Ge and Ag-Cu_3Ge-Ge. Both systems belong to simple eutectic type. The ternary eutectic points lie in." E_1, Ag(22.0)-Cu(58.8)-Ge(19.2), 632℃ and E_2 , Ag(44.3)-Cu(29.5)-Ge(26.2), 533℃. The three side binary systems were redetermined.
关键词:
phase diagram
,
null
,
null
Journal of Alloys and Compounds
Crystal structures of compounds at ambient temperature in the pseudobinary system Gd5Ge4-La5Ge4 were studied by X-ray powder diffraction (XRD). There exist three single-phase regions in this system. The crystal structure of Gd5Ge4, La5Ge4 and Gd3La2Ge4, which are prototype compounds in three phase regions, respectively, were reported. The Gd5Ge4 and La5Ge4 crystallize in the orthorhombic Sm5Ge4-type structure with space group Pnma. The ternary intermediate compound Gd3La2Ge4, which is determined for the first time, crystallizes in the monoclinic Gd5Si2Ge2-type structure with space group P112(1)/a. The Rietveld powder diffraction profile fitting technique was used for the refinement of crystal structure. The lattice parameters, atomic occupations, interatomic distances of the Gd5Ge4, La5Ge4 and Gd3La2Ge4 compounds were derived. (C) 2003 Elsevier B.V. All rights reserved.
关键词:
rare earth compounds;crystal structure;X-ray diffraction;phase-relationships;gd-5(si2ge2);transition;silicon
Journal of Physics-Condensed Matter
The local electronic density of states (LDOS) has been calculated for Fe-Ge(110), Fe-Ge(111) and Fe-Ge(100) interfaces and neighbouring atomic planes using the recursion method. Interface states are found to exist within the mutual gaps of the constituent atoms and strongly depending on the local atomic environments. The most excess LDOSS are found for Fe-Ge(111) interface and the least for Fe-Ge(110). The magnetic moments for Fe atoms are found to decrease when the Fe layer approaches the interface boundary, which is in accord with the experiments. The electron spin polarization parameters evaluated from the LDOS are qualitatively consistent with experimental measurements.
关键词:
spin polarization;surface magnetization;recursion method;states;iron;films;ni
Applied Physics Letters
Uniform Ge-nanocrystals (Ge-ncs) embedded in amorphous SiO(2) film were formed by using (74)Ge(+) ion implantation and neutron transmutation doping (NTD) method. Both experimental and theoretical results indicate that the existence of As dopants transmuted from (74)Ge by NTD tunes the already stabilized (crystallized) system back to a metastable state and then activates the mass transfer processes during the transition form this metastable state back to the stable (crystallized) state, and hence the nanocrystal size uniformity and higher volume density of Ge-ncs. This method has the potential to open a route in the three-dimensional nanofabrication. (C) 2011 American Institute of Physics. [doi:10.1063/1.3553770]
关键词:
transmutation-doped gaas;electrical-properties;misfit dislocations;lasers go;silicon;films
杨瑞东
,
陈寒娴
,
邓荣斌
,
孔令德
,
陶东平
,
王茺
,
杨宇
功能材料
采用磁控溅射设备,当衬底温度为500℃时,在Si(100)基片上磁控溅射生长Ge/Si多层膜样品.使用Raman,AFM和低角X射线技术对样品进行检测和研究,结果表明通过控制Ge埋层的厚度,可以调制Ge膜的结晶及晶粒尺寸,获得晶粒平均尺寸和空间分布较均匀的多晶Ge/Si多层膜.
关键词:
Ge/Si纳米多层膜
,
埋层
,
纳米晶粒