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Interfacial Interaction in Coated Carbon Fibre Reinforced Aluminous Mg-based Composites

Kun LI , Nanlin SHI , Jun GONG , Chao SUN , null , null , null , null

材料科学技术(英文)

Four kinds of Mg alloys reinforced with carbon fibres were fabricated by a gas pressure infiltration technique. The fibres were pre-coated a SiO2 layer prior to fabrication. Different microstructures and interactions in the fibre-matrix interface of these composites were observed by transmission electron microscopy (TEM). The results showed that the interfacial interaction strongly depended on the content of Al in the Mg-based matrices. The microstructure of the interface could then be controlled by adjusting the Al content of the Mg-based matrix. In addition, fibres extracted from different Mg-based matrix all had some degradation owing to the interfacial reaction and the fibre-matrix interdiffusion.

关键词: Carbon fibre , null , null , null

Carrier Density and Plasma Frequency of Aluminum Nanofilms

Hao DU , Jun GONG , Chao SUN , Rongfang HUANG , Lishi WEN , W.Y.Cheung , S.P.Wong

材料科学技术(英文)

In this work, the prerequisite and mode of electromagnetic response of Al nanofilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency---film thickness relation as well. Similarity of both plasma frequency---film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms.

关键词: Aluminum nanofilm , null , null

Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing

Meng CHEN , Xuedong BAI , Jun GONG , Chao SUN , Rongfang HUANG , Lishi WEN

材料科学技术(英文)

Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that ail 110 films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of ITO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23 x 10(-4) R cm and average transmittance of similar to 78% at wavelength of 400 similar to 700 nm have been achieved for the films on polyester at room temperature.

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