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Simulations of the Dependence of Gas Physical Parameters on Deposition Variables during HFCVD Diamond Films

Aiying WANG , Kwangryeol Lee , Chao SUN , Lishi WEN , null , null , null , null

材料科学技术(英文)

During the growth of the hot filament chemical vapor deposition (HFCVD) diamond films, numerical simulations in a 2-D mathematical model were employed to investigate the influence of various deposition parameters on the gas physical parameters, including the temperature, velocity and volume density of gas. It was found that, even in the case of optimized deposition parameters, the space distributions of gas parameters were heterogeneous due primarily to the thermal blockage come from the hot filaments and cryogenic pump effect arisen from the cold reactor wall. The distribution of volume density agreed well with the thermal round-flow phenomenon, one of the key obstacles to obtaining high growth rate in HFCVD process. In virtue of isothermal boundary with high temperature or adiabatic boundary condition of reactor wall, however, the thermal round-flow was profoundly reduced and as a consequence, the uniformity of gas physical parameters was considerably improved, as identified by the experimental films growth.

关键词: Gas physical parameters , physical , parameters , simulations , di

Carrier Density and Plasma Frequency of Aluminum Nanofilms

Hao DU , Jun GONG , Chao SUN , Rongfang HUANG , Lishi WEN , W.Y.Cheung , S.P.Wong

材料科学技术(英文)

In this work, the prerequisite and mode of electromagnetic response of Al nanofilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency---film thickness relation as well. Similarity of both plasma frequency---film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms.

关键词: Aluminum nanofilm , null , null

Simulations of Temperature Field in HFCVD Diamond Films over Large Area

Aiying WANG , Chao SUN , Rongfang HUANG , Lishi WEN

材料科学技术(英文)

A three-dimensional model was developed to investigate the influence of various hot filaments parameters on substrate temperature fields that significantly affect the nucleation and growth of diamond films over large area by hot-filament chemical vapor deposition (HFCVD). Numerical simulated results indicated that substrate temperature varies as a function of hot filaments number, radius, temperature, emissivity, the distance between filaments, and the distance between substrate and filaments arrangement plane. When these filaments parameters were maintained at the optimal values, the homogeneous substrate temperature region of 76mm×76mm with the temperature fluctuation no more than 5% could be obtained by a 80mm×80mm hot filaments arrangement plane. Furthermore, the homogeneous region could be enlarged to 100mm×100mm under the condition of supplementary hot filaments with appropriate parameters. All of these calculations provided the basis for specially optimizing the hot filaments parameters to deposit uniform diamond film over large area by HFCVD.

关键词: HFCVD , null , null , null

Growth and microstructure of r.f. sputtered Fe/Ti multilayers

Wei WANG , Lishi WEN

材料科学技术(英文)

Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar structure, interface morphology, and metastable phase presented at the interface of the multilayer system strongly depend on the bilayer thickness (Lambda). For high period multilayers, the waviness wavelength of interfaces is about two times broader than the column diameter. For a sample with Lambda =30 nm, its column width and waviness wavelength was about 80, and 190 nm, respectively. Both of them decreased with the reduction of Lambda, so as to nearly equal values of column diameter and waviness wavelength were obtained. The Fe and Ti grains of both 30 nm and 6 nm multilayers are polycrystalline, and have a textured structure. In short bilayer thickness (Lambda =6 nm), the intermetallic compound Fe2Ti was presented at the interfaces due to solid state reaction, for Lambda =2 nm, amorphous phase Ti-rich layer was formed at the interfaces, resulting in a sharp interface multilayer structure.

关键词:

Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing

Meng CHEN , Xuedong BAI , Jun GONG , Chao SUN , Rongfang HUANG , Lishi WEN

材料科学技术(英文)

Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that ail 110 films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of ITO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23 x 10(-4) R cm and average transmittance of similar to 78% at wavelength of 400 similar to 700 nm have been achieved for the films on polyester at room temperature.

关键词:

Size effect of electromagnetic constitutive characteristics of ultrathin Al films

Xuedong BAI , Meng CHEN , Lishi WEN , R.F.Huang

材料科学技术(英文)

The ultrathin aluminum films with thickness in the range of 2 similar to 60 nm have been deposited by de magnetron sputtering apparatus. Reflectance and transmittance of the obtained samples were measured with a WFZ-900-D4 UV/VIS spectrophotometer. The optical constant (n, k) and permittivity (epsilon', epsilon ") were determined by applying Newton-Simpson recurrent substitution method. The results indicate that the electromagnetic constitutive characteristic of ultrathin aluminum films is a function of thickness and has obvious size effect.

关键词:

基于遗传算法的磁流变阻尼器模型参数识别

周晓宏 , 刘红军 , 刘鹏

功能材料

优化技术是一种以数学为基础,可用来求解各种工程问题最优解的应用技术.本文利用磁流变阻尼器动态特性数据,采用遗传算法进行阻尼器模型参数识别优化过程,最终将得到的磁流变阻尼器模型参数用于土木工程结构振动控制研究.已建立的磁流变阻尼器的动力特性将在不同的电场强度和变化的位移幅度下进行测试,可以得到在不同位移和速度下恢复力的滞回曲线,建立Bouc-Wen模型.把根据试验得到的滞回曲线和使用遗传算法对模型参数进行优化的结果进行比较可知,这种模型的参数可以以十分小的误差得到优化.

关键词: 遗传算法 , 阻尼器 , 参数识别

曳力和湍流对超临界水流化床传热特性的影响

吕友军 , 董旭斌 , 张天宁

工程热物理学报

本文采用基于颗粒动力学的欧拉双流体模型,对比研究了曳力和湍流对超临界水流化床传热特性的影响,选取了Gidaspow、Syamlal-O'Brien和Wen-Yu三种曳力模型以及标准κ-ε、RNG κ-ε、Realizable κ-ε湍流模型三种高Re数湍流模型及低Re数κ-ε湍流模型.研究结果表明,在三种曳力模型中,Gidaspow曳力模型在超临界水流化床中更为适用;对于所采用的四种κ-ε湍流模型,利用三种高雷诺数湍流模型模拟所得床层与壁面间传热系数基本一致且大于采用低雷诺数模型模拟所得传热系数,而综合考虑,RNGκ-s湍流模型更适于超临水流化床传热特性的研究.

关键词: 超临界水流化床 , 曳力 , 湍流 , 传热

云南高钛渣流态化氯化冷态模型数值模拟

朱奎松 , 刘松利 , 芶淑云 , 王梁

钢铁钒钛 doi:10.7513/j.issn.1004-7638.2017.02.005

基于欧拉-双流体模型和流态化氯化临界流化速度经验公式,结合云南高钛渣物性参数,研究了其流态化氯化的初始流化速度下高钛渣流态化氯化特性、气泡运动对床层的扰动、气泡大小与分布板位置关系.研究结果表明:Grace方程能准确预测B类颗粒窄粒径的高钛渣流态化氯化气泡行为,Wen-Yu方程预测的初始流化速度下乳相和气泡出现时间延后;完全流化速度下,通过上升、合并长大、破裂过程,在分布板位置形成气泡;通过钛渣固体矢量图得出,整个床层以气泡为分界,气泡上升对上、下部颗粒的流动产生影响,导致床层不均匀.

关键词: 四氯化钛 , 高钛渣 , 氯化 , 流化床 , 数值模拟 , 流动特性

卵形弹丸撞击下 FRP层合板的侵彻和穿透

覃悦 , 文鹤鸣 , 何涛

复合材料学报 doi:10.3321/j.issn:1000-3851.2007.02.023

研究了卵形弹丸撞击下FRP层合板的侵彻和穿透性能,在局部化破坏模式假定的基础上改进了Wen提出的能量简化分析模型.改进模型仍假设弹体在侵彻过程中表面所受靶体的平均压力由靶体材料弹塑性变形所引起的静态阻力和速度效应引起的动阻力两部分组成,认为侵彻过程中靶体对弹的阻力不再是一个常数,而是与侵彻速度相关的函数.同时针对不同厚度靶板的破坏模式,建立了几种不同的侵彻和穿透模型.通过弹头长度与靶板厚度的比较,将侵彻过程分为部分侵彻和完全侵彻;穿透过程分为薄板穿透和中厚板穿透.并且根据不同的破坏方式给出了求解卵形弹丸的侵彻深度、残余速度和极限速度的预测公式.模型预测与实验数据进行了比较,发现侵彻深度和弹道极限速度的理论预测值与实验数据吻合得很好.

关键词: FRP层合板 , 侵彻 , 穿透 , 弹道极限 , 卵形弹丸

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