W.N.Liu 1)
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M.N.Fang 2)
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J.Xing 1) and Y.W.Liu 3) 1) Department of Mechanical Engineering
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Changchun Institute of Optics and Fine Mechanics
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Changchun 130022
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China 2) Changchun Institute of Post and Telecommunications
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Changchun 130022
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China 3) Changchun Institute of Optics and Fine Mechanics
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Changchun 130022
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China
金属学报(英文版)
In this paper, we describe the laser heat-treating experiment results of three kind tool high-speed steel test samples. After laser quenching and tempering of three kinds of annealed tool high speed steel (W18Cr4V, W9Mo3Cr4V1, W6Mo5Cr4V2) test samples, we used microhardness-measure to test the samples and analyzed such problems as the hardness and depth of hardening quenching layer. Furthermore, after laser quenching and tempering of the quenched and three time tempered high speed steel (W18Cr4V) and its hardness analyzing, we got lase quenching's different results of the samples under different initial heat treating.
关键词:
high-speed steel
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null
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null
曾鹏
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胡社军
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谢光荣
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黄拿灿
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吴起白
材料科学与工艺
doi:10.3969/j.issn.1005-0299.2000.03.009
采用Ti/W复合靶,用多弧离子镀技术沉积了Ti-W -N多元多层膜,并对其组织结构与性能进行了研究.结果表明:在本试验条件下多元膜的结构形式为(Ti, W)2N,最佳多层膜的结构形式为基体/Ti/TiN/(TiyW1-y )N/(Ti,W)2N,并具有较高的显微硬度和极低的孔隙率,在800 ℃具有很好的抗氧化性能.在沉积过程中存在着多元合金膜层与复合靶的成分离析现象,这与靶材的结构有关.
关键词:
多弧离子镀
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Ti-W-N多元膜
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多层膜
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组织与性能
赵峰
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杨志懋
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丁秉钧
稀有金属材料与工程
为节约Cr资源,提高CuCr触头材料的耐电击穿性能并满足其大规模生产的需要,根据W、Co的选择相强化作用, 以纯Cu、Cr块为原料, 采用Ar气保护熔炼法制备CuCr25W1Col触头合金,并对其性能进行研究.实验结果表明,该合金晶粒尺寸细小,含气量低,耐电压强度已达到常规触头材料的水平.
关键词:
CuCr触头材料
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选择相强化
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耐电压强度
刘伟吉
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曾庆明
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李献杰
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敖金平
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赵永林
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郭建魁
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徐晓春
功能材料与器件学报
doi:10.3969/j.issn.1007-4252.2000.03.015
发展了WN/W难熔栅自对准工艺.WN/W栅在850oC下退火,保持了较好的形貌.在此工艺基础上研制出了适用于互补逻辑电路的增强型n沟道异质结场效应晶体管.在1×50μm的HFET中,实现了最大跨导约为56mS/mm,阈值电压为3.5V.与p型HFET的-3V的阈值基本对称.反向击穿电压为4~5V.
关键词:
WN/W
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难熔栅
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CHFET
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HIGFET
肖晓
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姚琲
中国有色金属学报(英文版)
doi:10.1016/S1003-6326(17)60124-9
采用反应磁控溅射仪制备一系列不同铝含量(0~38.6%,摩尔分数)的W1?xAlxN复合膜.利用EPMA、XRD、XPS、纳米压痕仪、SEM及HRTEM等对膜组成、显微组织、力学及抗氧化性能进行表征,研究Al含量对WAlN膜显微组织和抗氧化性能的影响.结果表明,WN膜为面心立方结构,W1?xAlxN膜由面心立方W(Al)N和六方纤锌矿结构AlN组成,具有很强的(111)和(200)取向.其硬度随Al含量增加先增大后减小.当Al含量为32.4%(摩尔分数)时硬度达到最大值,为36 GPa.与WN相比,W1?xAlxN膜表现出更优的抗氧化性能,这主要归因于表层形成的致密Al2O3层.
关键词:
W1?xAlxN膜
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显微组织
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硬度
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抗氧化性能
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Al2O3层
宋双喜
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刘玉章
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毛大立
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李明
功能材料与器件学报
doi:10.3969/j.issn.1007-4252.2005.02.015
研究了铜与硅之间W/Mo-N薄膜的扩散阻挡性能.在Si(100)基片上利用反应溅射沉积一层Mo-N薄膜,然后再利用直流溅射在Mo-N上面沉积Cu/W薄膜.样品在真空下退火,并利用四点探针、X射线衍射分析、扫描电镜分析、俄歇电子能谱原子深度剖析等测试方法研究了Cu/W/Mo-N/Si的热稳定性及W/Mo-N薄膜对铜与硅的扩散阻挡性能.实验分析表明,Cu/W/Mo-N/Si结构具有非常好的热稳定性,在600℃退火30min仍未发生相变,并能有效的阻挡铜与硅之间的扩散.
关键词:
W/Mo-N
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扩散阻挡层
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溅射
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热稳定性
Corrosion Science
An electrochemical investigation was carried out to study the corrosion of pure magnesium in 1 N NaCl at different pH values involving electrochemical polarisation, scanning tunnel microscopy (STM), measurement of hydrogen gas evolution and measurement of the elements dissolved from the magnesium specimen which were determined by inductively coupled plasma atomic emission spectrophotometry (ICPAES). A partially protective surface film was a principal factor controlling corrosion. Film coverage decreased with increasing applied electrode potential. Application of a suitable external cathodic current density was shown to inhibit magnesium dissolution whilst at the same time the hydrogen evolution rate was relatively small. This showed that cathodic protection could be used to significantly reduce magnesium corrosion. A new definition is proposed for the negative difference effect (NDE). (C) 1997 Elsevier Science Ltd.
关键词:
magnesium;electrochemical corrosion;cathodic protection;STM;kinetics;behavior;mg
喻利花
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王蕊
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许俊华
材料热处理学报
采用多靶反应磁控溅射设备制备了一系列不同基体负偏压的W-C-N复合膜.采用X射线衍射仪、扫描电镜、能量色散谱仪、纳米压痕仪和摩擦磨损仪对薄膜进行表征.结果表明:当负偏压小于等于80 V时,薄膜表现出六方α-WCN相结构,增加到120 V时,转变为立方β-WCN相,薄膜硬度、弹性模量和膜基结合力出现对应最佳性能点的峰值;随着负偏压的增大,薄膜质量得到改善,磨损率和摩擦系数明显降低,负偏压达到200 V时,磨损率和摩擦系数分别出现最低值4.22×10-6 mm3·N-1 ·m-1和0.27;薄膜的磨损机制主要是磨粒磨损.
关键词:
W-C-N复合膜
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磁控溅射
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基体负偏压
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摩擦磨损性能