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LI Zongbao , YAO Kailun
武汉理工大学学报-材料科学版(英文版) doi:10.1007/s11595-015-1242-2
关键词:
Applied Physics a-Materials Science & Processing
Amorphous aluminate YAlO3 (YAO) thin films on n-type silicon wafers as gate dielectric layers of metal - oxide semiconductor devices are prepared by pulsed laser deposition. As a comparison, amorphous aluminate LaAlO3 (LAO) thin films are also prepared. The structural ...
关键词: hafnium oxide;si;stability;silicon;transition;dioxide;devices;hfo2