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Pulsed laser deposition of aluminate YAlO3 and LaAlO3 thin films for alternative gate dielectric applications

Applied Physics a-Materials Science & Processing

Amorphous aluminate YAlO3 (YAO) thin films on n-type silicon wafers as gate dielectric layers of metal - oxide semiconductor devices are prepared by pulsed laser deposition. As a comparison, amorphous aluminate LaAlO3 (LAO) thin films are also prepared. The structural and electrical characterization shows that the as-prepared YAO films remain amorphous until 900 degrees C and the dielectric constant is similar to 14. The measured leakage current of less than 10(-3) A/cm(2) at a bias of V-G = 1.0 V for similar to 40-nm-thick YAO and LAO films obeys the Fowler Nordheim tunneling mechanism. It is revealed that the electrical property can be significantly affected by the oxygen pressure during deposition and post rapid thermal annealing, which may change the fixed negative charge density at the gate interface.

关键词: hafnium oxide;si;stability;silicon;transition;dioxide;devices;hfo2

Intensified alkaline leaching pretreatment of refractory gold concentrates at common temperature and pressure

Transactions of Nonferrous Metals Society of China

A new process for the hydrometallurgy of refractory gold concentrates was presented. The process comprises grinding-leaching, intensified alkaline leaching (IAL), cyanidation and adsorption. In a stirring-type pulverizing-leaching tower mill, the concentrate is ground to <35. 6 μm of 95. 5 % while simultaneously leached by NaOH of 12 kg/t, then carried out intensified alkaline leaching for 48 h by NaOH of 108 kg/t in enhanced agitation tanks with the pulp concentration of 40% solids at the environmental temperature of 9. 5 &SIM; 13. 5 &DEG;C and the environmental pressure of 10(5) Pa. The oxidation rate of As is 94. 9%, and 47. 6% for S. The total consumption of NaOH is only 20% of that theoretically calculated under the conditions of full oxidation at the same oxidation rates of arsenic to arsenate and sulfur to sulfate. The gold leaching rate by NaCN in 24 h is increased from 9. 2% before pretreatment to 94. 2%. The consumption of NaCN is 7. 5 kg/t, which is one times less than that before pretreatment. The extraction cost of gold is about 422 Yuan/t.

关键词: refractory gold concentrates;grinding-leaching;intensified alkaline;leaching (IAL);pretreatment;common temperature and pressure

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