{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"选择有限的采样灰度级准确拟合出整个灰度区间的亮度和灰度关系,是影响LCD面板Mura改善效果、实时性和成本的关键因素.通过迭代方法优化采样灰度级,并采用分段伽马拟合方法研究了采样灰度级对Mura改善的影响.针对1 920×1 080的55 inTFT-LCD模组,6个采样灰度级的优化使拟合亮度曲线与实际亮度曲线的相对误差之和在0～255灰度级从5.64降到3.68,4个采样灰度级的优化使相对误差之和从29.27降到8.98.通过对6个和4个优化采样灰度级的实验结果比较和分析,结果表明,4个优化采样灰度级可以在Mura改善效果、实时性及成本三者之间达到较好的平衡.","authors":[{"authorName":"屠震涛","id":"ea8122fd-5709-4286-9369-effb9461a0f5","originalAuthorName":"屠震涛"},{"authorName":"樊瑞","id":"b5c36c95-875c-4501-b0e3-0c7a32aa8bdc","originalAuthorName":"樊瑞"},{"authorName":"张小宁","id":"48e6f739-fb48-418a-978b-9b799665755a","originalAuthorName":"张小宁"},{"authorName":"梁志虎","id":"86cf4410-52e1-4bee-8dc8-eb7865c4c8fc","originalAuthorName":"梁志虎"},{"authorName":"黄泰钧","id":"f2e0ab12-7a56-41c0-8d3c-c1337326c5e3","originalAuthorName":"黄泰钧"},{"authorName":"梁鹏飞","id":"4e043c32-a0c0-4a79-8ff0-104f6933f57f","originalAuthorName":"梁鹏飞"},{"authorName":"王利民","id":"0385fe8c-ab44-47c4-b408-47fac5c13c40","originalAuthorName":"王利民"}],"doi":"10.3788/YJYXS20163105.0442","fpage":"442","id":"deea2b5b-4ad2-4792-9fe0-7f3b32400f8b","issue":"5","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"58c43c7d-e182-4fb1-9650-584b476f576a","keyword":"液晶显示屏","originalKeyword":"液晶显示屏"},{"id":"99095fcb-3aa7-4b2f-a3e0-ace1db4fa360","keyword":"Mura缺陷","originalKeyword":"Mura缺陷"},{"id":"5102ea61-94a7-4976-aaec-cb3e7e7ae4c0","keyword":"分段伽马拟合","originalKeyword":"分段伽马拟合"}],"language":"zh","publisherId":"yjyxs201605003","title":"灰度与亮度拟合对LCD面板Mura改善的影响","volume":"31","year":"2016"},{"abstractinfo":"针对传统的Chan-Vese模型(C-V模型)分割背景不均匀的TFT-LCD Mura缺陷速度慢的问题,将水平集函数与符号距离函数的偏差作为能量项引入C-V模型,去掉了符号距离函数重初始化步骤;为了平衡图像的整体亮度不均匀,在传统的C-V模型中引入轮廓曲线内、外部区域之间的亮度差项,提高了分割准确性.在数值实现上,采用无条件稳定的半隐差分格式,适当加大步长,加速曲线演化过程,相比于有限差分格式和AOS格式,分割速度明显提高.实验结果表明,本文提出的算法能够准确地分割背景不均匀的Mura缺陷图像,并且分割速度快.","authors":[{"authorName":"卢小鹏","id":"dafa35e5-86f0-4227-8a77-e293f400c038","originalAuthorName":"卢小鹏"},{"authorName":"李辉","id":"7de9d103-91ce-4639-bbb0-134b324fd7a0","originalAuthorName":"李辉"},{"authorName":"刘云杰","id":"0558eedb-b610-4b9c-866e-8ed7aa28e182","originalAuthorName":"刘云杰"},{"authorName":"梁平","id":"292de6f4-6066-4049-804d-45d9e0821041","originalAuthorName":"梁平"},{"authorName":"李坤","id":"4682d6b1-84aa-44da-bea2-2cd642a721e6","originalAuthorName":"李坤"}],"doi":"10.3788/YJYXS20142901.0146","fpage":"146","id":"2b8611ca-953c-46da-b22c-23a4ce0c4279","issue":"1","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"0be89176-9acc-4a4e-8310-bf2362e4e2b0","keyword":"Chan-Vese模型","originalKeyword":"Chan-Vese模型"},{"id":"000632a0-52a0-4db0-97b6-2991ddeb6e52","keyword":"TFT-LCD Mura缺陷","originalKeyword":"TFT-LCD Mura缺陷"},{"id":"db46042a-329f-4c01-b05f-6f052977961f","keyword":"水平集","originalKeyword":"水平集"},{"id":"0f1ba79e-611f-44a0-a1ee-94186cd1cc25","keyword":"半隐差分格式","originalKeyword":"半隐差分格式"}],"language":"zh","publisherId":"yjyxs201401023","title":"基于Chan-Vese模型的TFT-LCD Mura缺陷快速分割算法","volume":"29","year":"2014"},{"abstractinfo":"液晶显示屏 Mura缺陷是一类较难检测的显示缺陷，它具有对比度低、背景亮度不均匀、边缘模糊等特点。针对传统Chan-Vese模型(C-V模型)对其分割时存在误分割及速度慢的问题，本文提出一种改进的C-V模型。首先，依据曲线演化理论，简化了传统C-V模型的图像数据力驱动项，这样减少了迭代过程中的计算量，提高了分割的速度。其次，为了平衡图像的亮度不均匀，在模型中引入一个新的能量项，该能量项与轮廓曲线内、外部之间的亮度差有关，提高了分割的准确性。最后，在算法的实现过程中引入迭代停止的判别式，通过设定分割的精度可以实现迭代的自动停止，并有利于正确地分割出目标。实验结果表明，本文提出的改进C-V模型能够准确分割背景不均匀的 Mura缺陷，并且具有较快的速度。","authors":[{"authorName":"陈凌海","id":"73eba843-829c-47c9-b196-5d0e40fe8a9a","originalAuthorName":"陈凌海"},{"authorName":"姚剑敏","id":"79b87948-fed3-4eff-9578-803d6269d787","originalAuthorName":"姚剑敏"},{"authorName":"郭太良","id":"3a5c023a-d036-47ba-a648-e025b7e9b018","originalAuthorName":"郭太良"}],"doi":"10.3788/YJYXS20163106.0613","fpage":"613","id":"92a169a3-3065-4f05-88a5-1dc5093afa5d","issue":"6","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"f14dace9-ff24-459f-8656-d2ff30c80051","keyword":"Chan-Vese模型","originalKeyword":"Chan-Vese模型"},{"id":"3209d372-eff6-4ef6-9641-44a8e3e3961e","keyword":"液晶显示屏 Mura缺陷","originalKeyword":"液晶显示屏 Mura缺陷"},{"id":"d3f62fc6-a918-4a15-beaf-76bfa62ad08d","keyword":"亮度不均匀","originalKeyword":"亮度不均匀"}],"language":"zh","publisherId":"yjyxs201606013","title":"基于改进Chan-Vese模型的液晶显示屏Mura缺陷分割","volume":"31","year":"2016"},{"abstractinfo":"提出一种以MATLAB为主要工具的TFT-LCD屏显示缺陷检测方案,该方案根据CMOS工业摄像机采集到的数字图像,结合二维图像拟合技术和以韦伯定律为原理的自动阈值获取技术,使用MATLAB作为数字图像分析工具实现对屏幕缺陷的检测.介绍了该方案的硬件组成和检测原理.给出了MATLAB算法流程和部分代码、介绍了GUT检测界面的设计和详细的检测步骤及结果,为TFT-LCD液晶屏显示缺陷的检测提供了一种快速有效的方法.","authors":[{"authorName":"刘毅","id":"c6608f18-b430-47a7-bec7-1ade6d5c0823","originalAuthorName":"刘毅"},{"authorName":"郑学仁","id":"d2fbfc88-198e-422c-a693-e2bb9eba0956","originalAuthorName":"郑学仁"},{"authorName":"王亚南","id":"af30dbb8-747a-438d-8a3f-260027fc5f59","originalAuthorName":"王亚南"},{"authorName":"梁志明","id":"0f2943e1-43b3-482e-9302-118b32ee14a0","originalAuthorName":"梁志明"}],"doi":"10.3969/j.issn.1007-2780.2007.06.016","fpage":"731","id":"6dda346f-a526-41cb-9605-63d400a58926","issue":"6","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"1aeb9e70-a2aa-4c0b-a5c8-ed680248cc15","keyword":"TFT-LCD","originalKeyword":"TFT-LCD"},{"id":"27313e5b-ff18-41c3-8390-019948a4abfc","keyword":"MURA","originalKeyword":"MURA"},{"id":"782901d6-99d1-46a6-877d-feb5ccc55c66","keyword":"MATLAB","originalKeyword":"MATLAB"},{"id":"cb787a15-1260-45fe-82b8-6262cac7a35e","keyword":"缺陷检测","originalKeyword":"缺陷检测"}],"language":"zh","publisherId":"yjyxs200706016","title":"MATLAB在TFT-LCD屏显示MURA缺陷检测的应用","volume":"22","year":"2007"},{"abstractinfo":"为解决116.8 cm(46 in)广视角边缘场切换技术4mask面板生产中的阵列工艺中,发生的一种网点色斑缺陷,应用扫描电子显微镜、聚焦离子束、能谱仪、宏观微观观测仪和线宽测量仪等检测设备进行Mura及其结晶物成份分析,比较了TFT膜厚;进行了GI和PVX膜玻璃正反面1％HF酸腐蚀试验、下部电极温度升高10℃试验、工艺ash、n+刻蚀的后处理步骤和有源层BT试验.研究了沟道n+掺杂a-Si层的厚度对于Mura的影响.确定了Mura的发生源和影响因素,结果发现Mura形成机理,一为基板背部划伤,二为接触和不接触电极区域的温差异,三是刻蚀反应的生成物在有源层工艺黏附在基板背部,之后经过多层膜沉积、湿刻和干刻、剥离工艺后促使缺陷进一步放大.最后采用平板粗糙面下部电极、控制剩余a-Si厚度和升高温度的方法,消除了网点Mura,并使得整体Mura发生率降为0.08％.","authors":[{"authorName":"张定涛","id":"5514f1e4-8900-4e69-a8c5-abb57e12ad4a","originalAuthorName":"张定涛"},{"authorName":"李文彬","id":"36f37fab-fe89-4488-840a-4ecb7b1a6a4e","originalAuthorName":"李文彬"},{"authorName":"姚立红","id":"b75a5d45-ef81-4b05-9ca0-602e3068b917","originalAuthorName":"姚立红"},{"authorName":"郑云友","id":"c1c921c1-ada6-4436-839e-341440e42163","originalAuthorName":"郑云友"},{"authorName":"李伟","id":"6dafd097-62f1-441f-9cbf-e8228da4119e","originalAuthorName":"李伟"},{"authorName":"宋泳珍","id":"e9f4e54e-6cfa-4063-8d79-d201ab17cf27","originalAuthorName":"宋泳珍"},{"authorName":"袁明","id":"d1ec88f6-d2b7-4fcb-8912-cfeec23155a5","originalAuthorName":"袁明"},{"authorName":"张光明","id":"80dca34b-6f50-477f-b39f-d7d78eb94cb5","originalAuthorName":"张光明"}],"doi":"10.3788/YJYXS20132806.0860","fpage":"860","id":"e1b69bb6-a248-4f77-8b96-faaa1651ef6e","issue":"6","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"ff98c6ed-b3fc-483f-823a-321bd6222a09","keyword":"色斑","originalKeyword":"色斑"},{"id":"c257b3b3-2834-44cb-a174-158a49e58ea6","keyword":"薄膜晶体管","originalKeyword":"薄膜晶体管"},{"id":"f9629e8e-6023-4655-956e-793bbc82c70a","keyword":"非晶硅","originalKeyword":"非晶硅"},{"id":"276548a9-e8d4-49ac-be16-c9cdda12f9eb","keyword":"缺陷分析","originalKeyword":"缺陷分析"}],"language":"zh","publisherId":"yjyxs201306009","title":"TFT-LCD网点Mura的研究和改善","volume":"28","year":"2013"},{"abstractinfo":"TFT-LCD面板在屏幕上有斑点或波浪状Mura,影响液晶显示器的品质,经过图形匹配,缺陷与曝光机机台形貌匹配.通过对异常区域特性分析,发现异常区域的BM CD、BM 像素间距存在异常.对原因进行模型分析:玻璃在曝光机基台上局部区域发生弯曲,曝光距离变短,致使BM PR受光区域变小,BM CD会偏小,进而导致区域性透过光不均一产生Mura;玻璃弯曲后BM 像素间距相对于设计位置也会发生变化,从而导致漏光产生Mura.经过实验验证,BM CD和像素间距的偏差主要由机台凸起导致glass弯曲引起,可以通过降低吸附压力和研磨机台,来改善CD差异和像素间距偏移,同时像素间距偏移漏光,也可以通过增加CD来改善.最终通过BM CD增加、研磨机台和降低吸附压力措施,Stage Mura不良率由10.05％下降至0.11％.","authors":[{"authorName":"肖洋","id":"1db9ef2a-56f9-46be-93fc-b1a37f008db7","originalAuthorName":"肖洋"},{"authorName":"周鹏","id":"120d2cbb-d545-4209-a5cf-99fc5aec75c6","originalAuthorName":"周鹏"},{"authorName":"闫润宝","id":"b028190f-96c2-4291-8d07-4e386ab05f5b","originalAuthorName":"闫润宝"},{"authorName":"郑云友","id":"bc9f86c4-ee2b-47cc-ba5e-0fbdd5555218","originalAuthorName":"郑云友"},{"authorName":"齐勤瑞","id":"2a14ec1d-d83e-43fb-bab4-fae265c5f005","originalAuthorName":"齐勤瑞"},{"authorName":"魏崇喜","id":"351c9114-5cc1-4ec9-a1be-95d27bb254f6","originalAuthorName":"魏崇喜"},{"authorName":"章旭","id":"d60775b9-e6e2-4131-8367-df8a060f7625","originalAuthorName":"章旭"},{"authorName":"张然","id":"6f6675ad-09d7-4d0b-8be7-5d26a2dcf9e7","originalAuthorName":"张然"}],"doi":"10.3788/YJYXS20173204.0269","fpage":"269","id":"86234af5-d345-4df8-bf6f-4552fb50156a","issue":"4","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"cdfef682-ea3a-47a4-afff-fbbb9783f5b1","keyword":"薄膜晶体管液晶显示器","originalKeyword":"薄膜晶体管液晶显示器"},{"id":"efc9e868-c050-48e4-a929-e2f8ba0cd111","keyword":"色斑","originalKeyword":"色斑"},{"id":"46ab2845-b288-48f1-a070-223693c48496","keyword":"线宽","originalKeyword":"线宽"},{"id":"684e59a4-45e4-4eaa-aae0-4301c255fa99","keyword":"像素间距","originalKeyword":"像素间距"}],"language":"zh","publisherId":"yjyxs201704005","title":"TFT-LCD Stage Mura的研究与改善","volume":"32","year":"2017"},{"abstractinfo":"研究了摩擦强度对Zara漏光和摩擦痕Mura的影响.实验表明,当摩擦强度偏低时,Zara漏光易发生,而摩擦强度偏高时,则易引发摩擦痕Mura.通过选择合适的摩擦强度,可降低Zara漏光和摩擦痕Mura的发生率.另外,利用FIB对基板表面进行分析,找到了FFS型产品容易发生Zara漏光和摩擦痕Mura的原因.","authors":[{"authorName":"石天雷","id":"56be5bf2-247b-4251-b60f-dcc662728bb3","originalAuthorName":"石天雷"},{"authorName":"杨国波","id":"d1dcd7d7-1bee-4c89-aeb9-55a3cb941c03","originalAuthorName":"杨国波"},{"authorName":"程石","id":"dfe1726a-aedd-4a3c-8216-e80cdf70e2e3","originalAuthorName":"程石"},{"authorName":"杭苗","id":"b48d5cdd-5f69-4057-bde2-2d0348c297c1","originalAuthorName":"杭苗"}],"doi":"10.3788/YJYXS20122702.0208","fpage":"208","id":"b6af86be-b7d9-433c-a360-1a277313af3a","issue":"2","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"fb1fd1ff-2fc5-45cd-abcd-2a0d36ac4fce","keyword":"LCD","originalKeyword":"LCD"},{"id":"ab7c20d6-2316-4837-b63d-7b5aa2d43396","keyword":"Zara漏光","originalKeyword":"Zara漏光"},{"id":"9c39e295-ea2a-4643-a346-02f31d6b783d","keyword":"摩擦痕Mura","originalKeyword":"摩擦痕Mura"}],"language":"zh","publisherId":"yjyxs201202014","title":"Zara漏光和Rubbing Mura改善研究","volume":"27","year":"2012"},{"abstractinfo":"未确认Mura是一种能够影响TFT-LCD画面品质的不良.文章对未确认Mura不良进行了详细的分析,认为扇形区域出现有源层残留是导致未确认Mura不良发生的原因,介绍了一种通过变更曝光工艺条件来解决此种不良的方法,并通过试验论证了此方法的量产可行性.","authors":[{"authorName":"徐伟","id":"98c414e0-2290-4c3b-ac35-05023fb4534a","originalAuthorName":"徐伟"},{"authorName":"彭毅雯","id":"061203ad-cecf-4808-878f-ab52d3dbb951","originalAuthorName":"彭毅雯"},{"authorName":"肖光辉","id":"0a5074eb-a1a7-48d3-9e43-e7b79aa2a4e7","originalAuthorName":"肖光辉"}],"doi":"10.3788/YJYXS20112605.0612","fpage":"612","id":"8066b60f-9b7e-4598-9f7f-789e71d4310c","issue":"5","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"b34fd3f7-17ec-4b56-b184-d8c284503f07","keyword":"未确认Mura","originalKeyword":"未确认Mura"},{"id":"0d11677a-9ce2-4cb3-86aa-274d3e184956","keyword":"扇形区域","originalKeyword":"扇形区域"},{"id":"8069696e-1e14-4bb7-932b-7ee8a3553779","keyword":"有源层残留","originalKeyword":"有源层残留"},{"id":"2574a8cd-6b2e-4131-a69b-f0f4b9d7e897","keyword":"曝光工艺条件","originalKeyword":"曝光工艺条件"}],"language":"zh","publisherId":"yjyxs201105009","title":"未确认Mura分析及改善对策","volume":"26","year":"2011"},{"abstractinfo":"Touch Mura会影响液晶显示器侧视时的视觉效果,因此其检测也很严格.讨论了液晶量对Touch Mura的影响.实验结果表明,拍击位移量与Touch Mura严重程度有直接联系.随着液晶量增加,拍击位移量会变小,同时Touch Mura现象也会减轻直至消失.另外,不同人拍击或者拍击液晶面板位置为左侧或右侧,对拍击位移量随液晶量的变化趋势没有明显影响.","authors":[{"authorName":"张卓","id":"bee5d163-64f3-4c32-a7c3-4a0119df8755","originalAuthorName":"张卓"},{"authorName":"柳在健","id":"7867404c-fbf2-4be6-91e7-7c28bec3ece3","originalAuthorName":"柳在健"},{"authorName":"侯延冰","id":"fc084182-0a4e-460a-9a9c-a208a9ef66c8","originalAuthorName":"侯延冰"}],"doi":"10.3969/j.issn.1007-2780.2008.05.001","fpage":"525","id":"4db4735b-e631-4a85-8b00-ae1dde495375","issue":"5","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"92902ad6-f9fb-4a9d-8748-12521f934195","keyword":"液晶量","originalKeyword":"液晶量"},{"id":"809d6bf6-8c6c-4761-b2e2-1091db96a72f","keyword":"TouchMura","originalKeyword":"TouchMura"},{"id":"4af2817f-7d89-4616-af64-2ca6adcb1292","keyword":"拍击位移量","originalKeyword":"拍击位移量"}],"language":"zh","publisherId":"yjyxs200805001","title":"液晶量对Touch Mura的影响","volume":"23","year":"2008"},{"abstractinfo":"横线Mura是一种在TFT-LCD生产过程中产生的不良,对于画面品质有较大的影响.文中对横线Mura发生的原因进行分析,通过对金属膜层的应力测量及分析不良区域金属断面结构,认为横线Mura的发生是由于在栅电极成膜过程中,玻璃基板中心和边缘的Mo金属层的应力差异较大,造成在应力释放后Mo金属层与玻璃基板之间结合不紧密,从而影响到栅电极与源电极间的寄生电容参数发生变化和信号电平发生偏移.提出对栅电极膜层结构进行调整,将栅电极底层Mo金属膜去除可以有效地降低不良的发生比率,并进行了相关验证.","authors":[{"authorName":"周哲","id":"71760180-7978-4ec4-8473-7031fc373eda","originalAuthorName":"周哲"}],"doi":"10.3788/YJYXS20122705.0649","fpage":"649","id":"4ad00623-d0af-4cc0-b14f-6d98a36248a6","issue":"5","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"906f2de3-e3c5-4039-b686-c35f38049016","keyword":"横线Mura","originalKeyword":"横线Mura"},{"id":"d2139f60-d7ef-4c11-ba2a-4db4bf1af9f6","keyword":"薄膜","originalKeyword":"薄膜"},{"id":"552e164b-aae3-4a4c-9539-cd87f57b1f56","keyword":"应力","originalKeyword":"应力"},{"id":"359b76be-7d47-4092-b169-406d67fa76e8","keyword":"栅电极","originalKeyword":"栅电极"}],"language":"zh","publisherId":"yjyxs201205013","title":"横线Mura的分析与改善","volume":"27","year":"2012"}],"totalpage":652,"totalrecord":6511}