{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"反应溅射沉积技术(RSDT)可以生成纳米大小的颗粒并有效溅射形成性能稳定的催化层,是一项崭新的催化层制备技术.为从理论上研究RSDT过程的复杂物理化学过程,本文提出了RSDT过程的三维综合数学模型,模型描述了流体流动、热/质传递,并与燃料气的化学反应和液滴的燃烧相耦合.RNGκ-ε模型用于描述湍动燃烧气流,液滴的跟踪和分析在拉格朗日框架下进行,并利用Monte Carlo方法生成了催化层的表面结构.计算结果可以为该技术的优化提供一定的参考.","authors":[{"authorName":"胡桂林","id":"97ef9ed8-d2c4-40a8-82d2-fbccd399fb6a","originalAuthorName":"胡桂林"},{"authorName":"","id":"c4e3efc2-0898-47eb-83e4-da9ad04b7563","originalAuthorName":""},{"authorName":"","id":"11c3b2bd-e00c-413e-a8be-f87d4dfc9465","originalAuthorName":""},{"authorName":"李国能","id":"f4c13b7b-b37d-4bec-98ee-200403117e79","originalAuthorName":"李国能"},{"authorName":"张治国","id":"32c43650-a1ac-455d-99b6-76d9675ca0d6","originalAuthorName":"张治国"},{"authorName":"郑友取","id":"220d1ddf-1c2f-45f9-bce3-d5fb7f7fbf8e","originalAuthorName":"郑友取"}],"doi":"","fpage":"95","id":"09e95933-7072-4169-9f6d-d3ba72d7a8de","issue":"1","journal":{"abbrevTitle":"GCRWLXB","coverImgSrc":"journal/img/cover/GCRWLXB.jpg","id":"32","issnPpub":"0253-231X","publisherId":"GCRWLXB","title":"工程热物理学报 "},"keywords":[{"id":"b18c382a-fa82-4cdd-a457-e26943274478","keyword":"反应溅射沉积技术","originalKeyword":"反应溅射沉积技术"},{"id":"ce772b6e-55eb-4b82-b4ce-7dcc53fedaf7","keyword":"数值模拟","originalKeyword":"数值模拟"},{"id":"2928ff42-8707-41e9-9749-b48829e74af2","keyword":"RNGκ-ε模型","originalKeyword":"RNGκ-ε模型"},{"id":"bf661245-2fff-48ff-bfd3-548fd808d439","keyword":"蒙特卡洛法","originalKeyword":"蒙特卡洛法"},{"id":"0027e60c-7a19-4a38-ad57-25445dfef528","keyword":"多组分反应","originalKeyword":"多组分反应"}],"language":"zh","publisherId":"gcrwlxb201401022","title":"反应溅射沉积技术制备燃料电池催化层的模拟","volume":"35","year":"2014"},{"abstractinfo":"成分的有效控制是多元涂层材料研究和应用中的重点和难点。在反应溅射沉积 Berg 模型基础上建立了多元镶嵌靶溅射沉积涂层的成分模拟方法，以Ti、Al 和石墨三元镶嵌靶为例，模拟了靶材石墨含量及N2分压对TiAlCN涂层中Ti/Al原子比、C含量和N含量的影响，并对引起成分变化的内在原因进行了探讨。","authors":[{"authorName":"张旭海","id":"ece0bcd3-ba59-4689-97aa-456940846ede","originalAuthorName":"张旭海"},{"authorName":"曾宇乔","id":"5905805a-998b-4b7c-a69e-3016d00ad0d0","originalAuthorName":"曾宇乔"},{"authorName":"蒋建清","id":"f342d272-85c9-486b-ad1f-34ab2931eec1","originalAuthorName":"蒋建清"}],"doi":"10.3969/j.issn.1001-9731.2014.增刊(Ⅰ).035","fpage":"155","id":"c48563fa-9f24-4c27-9aab-e6b0e9456963","issue":"z1","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"a44572d6-218a-4a5c-a451-3be137d5b926","keyword":"成分模拟","originalKeyword":"成分模拟"},{"id":"41716be1-c4cd-4f9c-9a6a-684c849c10ca","keyword":"三元复合靶","originalKeyword":"三元复合靶"},{"id":"59863cc0-9632-4f56-8e58-976485142a4d","keyword":"反应溅射","originalKeyword":"反应溅射"}],"language":"zh","publisherId":"gncl2014z1035","title":"基于三元镶嵌靶的反应溅射沉积涂层成分模拟计算","volume":"","year":"2014"},{"abstractinfo":"应用直流磁控反应溅射法,在玻璃基体上制备了具有光催化活性的TiO2薄膜.TiO2薄膜的厚度随沉积时间的增加而均匀增长.基体温度则在溅射的最初1h很快上升到110℃,溅射7h基体温度不超过130℃.溅射2h得到的是非晶态TiO2薄膜,而溅射3～7h制备的薄膜为锐钛矿型结构.非晶态和小晶粒TiO2薄膜的紫外一可见透射光谱谱带边沿与结晶较好的TiO2薄膜相比有明显的蓝移,薄膜的透射率随沉积时间的增加而下降.钛以四价钛的形式存在于TiO2薄膜中.TiO2薄膜的光催化活性随沉积时间争薄膜厚度的增加而有较大提高.","authors":[{"authorName":"张文杰","id":"5f055d48-cca0-4306-bbc3-1ed4ff9b5c60","originalAuthorName":"张文杰"},{"authorName":"朱圣龙","id":"403971e6-f642-423e-998f-382a5f2a57af","originalAuthorName":"朱圣龙"},{"authorName":"李瑛","id":"ad2ee598-d818-45a3-8162-e542f4484237","originalAuthorName":"李瑛"},{"authorName":"王福会","id":"9c1ba1f7-fe5d-4826-990e-7d5c8932b0ce","originalAuthorName":"王福会"},{"authorName":"何红波","id":"dfcc1c6c-02c0-4856-9874-0fa640a1ff66","originalAuthorName":"何红波"}],"doi":"","fpage":"1785","id":"61e89674-a800-408c-8825-9f2bea666c09","issue":"11","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"f3e373df-851b-4534-a74a-cd79d97f6bb5","keyword":"磁控反应溅射","originalKeyword":"磁控反应溅射"},{"id":"00418575-8a3c-4025-a197-b0c522680395","keyword":"TiO2薄膜","originalKeyword":"TiO2薄膜"},{"id":"875a3e5b-ac92-4fa4-8b4e-09c16e9d5516","keyword":"光催化","originalKeyword":"光催化"},{"id":"2d07070d-bf81-4426-b65f-8b42d9ef5d1b","keyword":"沉积时间","originalKeyword":"沉积时间"}],"language":"zh","publisherId":"gncl200811006","title":"沉积时间对磁控反应溅射制备TiO2薄膜性能的影响","volume":"39","year":"2008"},{"abstractinfo":"采用RF反应溅射法在Si(111)、玻璃衬底上制备了具有良好C轴取向的多晶ZnO薄膜.用XRD分析了沉积条件(衬底温度、工作气体中的氧与氩气压比和衬底种类)对样品结构的影响.发现(1)薄膜的取向性随着衬底温度的升高而增强,超过400℃后薄膜质量开始变差;(2)工作气体中氧与氩气压比(PO2/PAr)为2:3时,薄膜取向性最好;(3)薄膜晶粒尺寸11～34nm,相同沉积条件下,单晶硅衬底样品(002)衍射峰强度减弱,半高宽无明显变化.","authors":[{"authorName":"龚恒翔","id":"cde120c3-5d93-4899-9c0f-ba93e5b5b1dd","originalAuthorName":"龚恒翔"},{"authorName":"阎志军","id":"5a96df73-3334-4fe5-8a73-8e66d9bdad8c","originalAuthorName":"阎志军"},{"authorName":"杨映虎","id":"b2ee5c31-59f2-410b-972c-c2162ea20f98","originalAuthorName":"杨映虎"},{"authorName":"王印月","id":"37183cab-76fd-4053-974e-391ce2c5d0a3","originalAuthorName":"王印月"}],"doi":"10.3969/j.issn.1007-4252.2000.04.033","fpage":"428","id":"4b093519-1854-4265-8ca8-7ce52aadd331","issue":"4","journal":{"abbrevTitle":"GNCLYQJXB","coverImgSrc":"journal/img/cover/GNCLYQJXB.jpg","id":"34","issnPpub":"1007-4252","publisherId":"GNCLYQJXB","title":"功能材料与器件学报 "},"keywords":[{"id":"12177a87-0d90-4902-bf33-dad972680ed9","keyword":"ZnO薄膜","originalKeyword":"ZnO薄膜"},{"id":"46571c28-4c1c-4577-8556-ae947b42a7dc","keyword":"RF反应溅射","originalKeyword":"RF反应溅射"},{"id":"25a26f5f-655c-4745-94d1-bb59093ac968","keyword":"择优取向","originalKeyword":"择优取向"}],"language":"zh","publisherId":"gnclyqjxb200004033","title":"沉积条件对RF反应溅射多晶ZnO薄膜结构的影响","volume":"6","year":"2000"},{"abstractinfo":"通过磁控反应溅射在H1模具钢表面沉积了CrN薄膜.用扫描电镜(SEM)、X射线衍射仪(XRD)观察了试样的表面形貌,进行了物相分析,研究了CrN薄膜的抗氧化性能,讨论了膜层的抗氧化行为和机制.结果表明:在500℃以下,CrN膜层具有良好的抗氧化性,能大大提高基体的抗氧化性能.当温度超过600℃时,由于膜层产生剥落而失去使用性能.","authors":[{"authorName":"李钦虎","id":"50d76c00-caad-4bb2-88b7-493a8990c575","originalAuthorName":"李钦虎"},{"authorName":"王军","id":"f1ea0ecc-1989-4bf1-94ef-f610d139a445","originalAuthorName":"王军"}],"doi":"10.3969/j.issn.1001-3660.2005.06.015","fpage":"40","id":"40fe4ea2-77e0-4ba0-be67-6cf2f9a30b74","issue":"6","journal":{"abbrevTitle":"BMJS","coverImgSrc":"journal/img/cover/BMJS.jpg","id":"3","issnPpub":"1001-3660","publisherId":"BMJS","title":"表面技术 "},"keywords":[{"id":"854415a2-edcc-4516-83a4-2b2506f9f257","keyword":"磁控溅射","originalKeyword":"磁控溅射"},{"id":"f6afa258-4fc0-40ec-ba75-7ae5c45525a6","keyword":"CrN薄膜","originalKeyword":"CrN薄膜"},{"id":"5cbdfac2-a9a2-4364-a081-4805c01b52e1","keyword":"抗氧化性","originalKeyword":"抗氧化性"}],"language":"zh","publisherId":"bmjs200506015","title":"磁控反应溅射沉积CrN薄膜的抗氧化性研究","volume":"34","year":"2005"},{"abstractinfo":"研究了平面磁控直流反应溅射法沉积氧化铝薄膜的过程。结果表明氧分压大小对反应溅射过程有决定性作用,当氧分压增大或减小过程中存在两个阈值。氧分压小于阈值为金属Al溅射区,大于阈值为氧化铝溅射区。在阈值附近总气压、溅射电压和沉积速率发生突变,溅射特性(V-J)曲线有不同规律。沉积的氧化铝膜为非晶态,高温下可晶化,本文还讨论了反应溅射的机理。","authors":[{"authorName":"楼翰一","id":"93674580-fdb4-41f6-800e-e3bb8ffd2bd2","originalAuthorName":"楼翰一"},{"authorName":"朱圣龙","id":"70dd3f98-3f77-4581-bed8-d3a85bc90895","originalAuthorName":"朱圣龙"},{"authorName":"王福会","id":"22a03963-19c0-4d1f-b37d-8bd70df09029","originalAuthorName":"王福会"},{"authorName":"吴维(?)","id":"7dd04e9a-85ff-48bd-b05f-9523b21ebfeb","originalAuthorName":"吴维(?)"}],"categoryName":"|","doi":"","fpage":"150","id":"9c5e0172-34c2-4b36-b8f7-b634754ae34e","issue":"3","journal":{"abbrevTitle":"JSXB","coverImgSrc":"journal/img/cover/JSXB.jpg","id":"48","issnPpub":"0412-1961","publisherId":"JSXB","title":"金属学报"},"keywords":[{"id":"e81d7953-015c-47c1-87fb-c78d45895146","keyword":"氧化铝膜","originalKeyword":"氧化铝膜"},{"id":"8e0aac6f-838d-488f-a2c6-394f9c2bf181","keyword":"amorphous film","originalKeyword":"amorphous film"},{"id":"444d860c-7318-48c5-98d2-588e3f6760d1","keyword":"reactive sputtering","originalKeyword":"reactive sputtering"}],"language":"zh","publisherId":"0412-1961_1991_3_28","title":"反应溅射非晶态氧化铝薄膜","volume":"27","year":"1991"},{"abstractinfo":"通过对溅射过程中辉光放电现象及薄膜沉积速率的研究,发现随着氮浓度的增大,靶面上形成一层不稳定的AlN层,由于AlN的溅射速率远小于Al,从而使薄膜的沉积速率显著下降.同时还研究了其它溅射参数对薄膜沉积速率的影响.结果表明:随靶基距的增大和靶功率的减小,不同程度引起沉积速率的下降;随着溅射气压的增大,最初沉积速率不断增大,当溅射气压增大到一定程度时,沉积速率达到最大值,之后随溅射气压的增大,又不断减小.","authors":[{"authorName":"许小红","id":"d71b37a9-f19b-40c7-bff8-55fa8f96bc24","originalAuthorName":"许小红"},{"authorName":"武海顺","id":"661291d3-e98f-4d34-b7d8-90960263e5a6","originalAuthorName":"武海顺"},{"authorName":"张富强","id":"6e6550bd-302a-478c-8687-11a71f6cc413","originalAuthorName":"张富强"},{"authorName":"张聪杰","id":"c6fd8d35-6497-48fd-972a-3ef18410ab01","originalAuthorName":"张聪杰"},{"authorName":"李佐宜","id":"d716ec04-8236-4ed7-8e66-b0abb8ee114d","originalAuthorName":"李佐宜"}],"doi":"","fpage":"209","id":"a9e55c98-172b-486c-8dc6-a4120799b1d4","issue":"3","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"762c9980-bdd1-48c8-8b54-55bd0fdf3ecf","keyword":"反应溅射","originalKeyword":"反应溅射"},{"id":"5c1a6982-5aa7-49af-acd5-a022562cf53b","keyword":"氮化铝薄膜","originalKeyword":"氮化铝薄膜"},{"id":"5f9f6684-273d-4192-a4bd-88413776c043","keyword":"沉积速率","originalKeyword":"沉积速率"}],"language":"zh","publisherId":"xyjsclygc200203012","title":"反应溅射制备AlN薄膜中沉积速率的研究","volume":"31","year":"2002"},{"abstractinfo":"研究了反应气体流量对磁控反应溅射ＮｉＣｒＯ_ｘ薄膜成分和光学常数的影响．在反应溅射过程中，ＮｉＣｒ靶随着Ｏ_２流量的增大出现毒化现象．在不同氧流量条件下可沉积出近于透明的介电薄膜和不透明的吸收薄膜．对薄膜光学常数的研究可应用到太阳能光谱选择性吸收薄膜的制备．","authors":[{"authorName":"曹韫真","id":"bbc97919-b091-42b8-b4d4-37884179dd29","originalAuthorName":"曹韫真"},{"authorName":"胡行方","id":"47b9534b-9614-4998-a77f-990ec93417a9","originalAuthorName":"胡行方"}],"categoryName":"|","doi":"","fpage":"304","id":"3662ee70-aa09-4bfa-b9a5-d89b3e782bcf","issue":"2","journal":{"abbrevTitle":"WJCLXB","coverImgSrc":"journal/img/cover/WJCLXB.jpg","id":"62","issnPpub":"1000-324X","publisherId":"WJCLXB","title":"无机材料学报"},"keywords":[{"id":"bb36d039-10bd-4d29-847d-bdbace8d76ac","keyword":"磁控反应溅射","originalKeyword":"磁控反应溅射"},{"id":"ed0631f5-c79b-4540-922e-375251e77588","keyword":" NiCrO_x thin films","originalKeyword":" NiCrO_x thin films"},{"id":"b3c91201-fb24-425a-a23e-c193c41ec6c2","keyword":" optical constants","originalKeyword":" optical constants"},{"id":"c6aaeb27-fe90-434d-af51-dcf416f391cb","keyword":" solar selective surface","originalKeyword":" solar selective surface"}],"language":"zh","publisherId":"1000-324X_2000_2_3","title":"反应溅射NiCrO_x薄膜过程及其光学性质的研究","volume":"15","year":"2000"},{"abstractinfo":"研究了反应气体流量对磁控反应溅射NiCrOx薄膜成分和光学常数的影响. 在反应溅射过程中，NiCr靶随着O2流量的增大出现毒化现象. 在不同氧流量条件下可沉积出近于透明的介电薄膜和不透明的吸收薄膜. 对薄膜光学常数的研究可应用到太阳能光谱选择性吸收薄膜的制备.","authors":[{"authorName":"曹韫真","id":"51656fdf-6871-47df-9a8b-6f208d529f23","originalAuthorName":"曹韫真"},{"authorName":"胡行方","id":"a25dc89b-dea3-4057-8a94-a4fd47bf3b88","originalAuthorName":"胡行方"}],"doi":"10.3321/j.issn:1000-324X.2000.02.018","fpage":"304","id":"47acd39b-151e-430f-9c62-6a4206545ed7","issue":"2","journal":{"abbrevTitle":"WJCLXB","coverImgSrc":"journal/img/cover/WJCLXB.jpg","id":"62","issnPpub":"1000-324X","publisherId":"WJCLXB","title":"无机材料学报"},"keywords":[{"id":"fcc28aa0-7b73-462e-b32e-4cd2020f5b74","keyword":"磁控反应溅射","originalKeyword":"磁控反应溅射"},{"id":"f0518523-4852-4fa5-8831-6ce0bdc02662","keyword":"NiCrOx薄膜","originalKeyword":"NiCrOx薄膜"},{"id":"2d7f6a99-46ef-4077-bd1c-752c10d37b2e","keyword":"光学常数","originalKeyword":"光学常数"},{"id":"6f002c81-d88c-4967-abcb-560c9ab47fe3","keyword":"光谱选择性吸收表面","originalKeyword":"光谱选择性吸收表面"}],"language":"zh","publisherId":"wjclxb200002018","title":"反应溅射 NiCrOx薄膜过程及其光学性质的研究","volume":"15","year":"2000"},{"abstractinfo":"采用中频反应磁控溅射技术沉积ZrN薄膜,在真空镀膜机内对称安装了3对矩形孪生靶.利用等离子体发射光谱和质谱仪QMS200分别实时监控真空炉内靶材表面的谱线变化和各种气氛的分压强,并通过控制系统氮气流量自动调控,从而消除了靶中毒和打火现象,确保了溅射镀膜的稳定进行.通过对氮化锆膜层的显微组织观察、X射线衍射和俄歇半定量分析,沉积的氮化锆薄膜膜层致密,与基体的结合牢固.结果表明:当炉内氮气分压强为45%,控制靶电压200V,靶电流为25A,逐步调节Ar与N2比例,可获得成分均匀,膜层致密,结合力较好的金黄色氮化锆薄膜.","authors":[{"authorName":"杨钰瑛","id":"8ef49189-7a3b-46ed-92ad-3e504993f4cb","originalAuthorName":"杨钰瑛"},{"authorName":"孙维连","id":"cf70a467-7ce1-452b-8a83-254404c2e509","originalAuthorName":"孙维连"},{"authorName":"李新领","id":"fcbd1676-b206-41e8-9dd9-73bd0118b8ca","originalAuthorName":"李新领"},{"authorName":"王会强","id":"4dc6d102-3610-46dc-95e8-0c84dd5fec5d","originalAuthorName":"王会强"},{"authorName":"孙玉梅","id":"4f8dce47-57e0-4aa2-a35a-e38fd839d225","originalAuthorName":"孙玉梅"}],"doi":"10.3969/j.issn.1009-6264.2007.02.007","fpage":"30","id":"b4363e5d-37c1-49d9-846b-7570588314dc","issue":"2","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"c1fca031-61e7-4c12-b7d6-775800b39cb4","keyword":"中频溅射","originalKeyword":"中频溅射"},{"id":"485e8df0-68f1-4323-a298-31ed2482d479","keyword":"孪生对靶","originalKeyword":"孪生对靶"},{"id":"3059e720-475f-4169-bd6e-93a04304be8c","keyword":"氮化锆","originalKeyword":"氮化锆"},{"id":"7438651b-949a-49ff-abcc-9d06a22e879b","keyword":"薄膜","originalKeyword":"薄膜"}],"language":"zh","publisherId":"jsrclxb200702007","title":"采用中频反应磁控溅射技术沉积氮化锆薄膜","volume":"28","year":"2007"}],"totalpage":6658,"totalrecord":66578}