Wentao HUANG
,
Jilin WANG
,
Zhinong LIU
,
Peiyi CHEN
,
Peihsin TSIEN
,
Xiangti MENG
材料科学技术（英文）
The change of electrical performances of 1 MeV electron irradiated silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) and Si bipolar junction transistor (BJT) was studied. After electron irradiation, both the collector current IC and the base current IB changed a little, and the current gain βdecreased a little for SiGe HBT. The higher the electron irradiation fluence was, the lower the IC decreased. For conventional Si BJT, IC and IB increased as well as βdecreased much larger than SiGe HBT under the same fluence. The contribution of IB was more important to the degradation of βfor both SiGe HBT and Si BJT. It was shown that SiGe HBT had a larger anti-radiation threshold and better anti-radiation performance than Si BJT. The mechanism of electrical performance changes induced by irradiation was preliminarily discussed.
关键词:
Electron irradiation
,
null
,
null
,
null
Guangli LUO
,
Xiaofeng LIN
,
Peiyi CHEN
,
Peixin TSIAN
材料科学技术（英文）
An ultrahigh vacuum chemical vapor deposition (UHV/CVD) system is developed and the details of its construction and operation are reported. Using high purity SiH4 and GeH4 reactant gases, the Si0.82Ge0.18 layer is deposited at 550 degrees C. With the measurements by double crystal X-ray diffraction (DCXRD), transmission electron microscopy (TEM) and Rutherford backscattering spectroscopy (RBS) techniques, it is shown that the crystalline quality of the SiGe layer is good, and the underlying SiGe/Si heterointerface is sharply defined.
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