O.Kyrylov
,
R.Cremer
,
D.Neuschütz
金属学报(英文版)
In the last years a variety of plasma sources have been developed for film depositionby plasma activated deposition techniques. In addition to RF- and DC-sources, pulsedplasma sources are gaining increased attention. This interest is driven by the wish ofdepositing coatings with superior properties ...
关键词:
alumina
,
null
,
null
,
null
