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Molecular Dynamics Simulation of Zero-Fluence and Low-Bombarding-Energy 63Cu-65Cu Sputtering

Liping ZHENG , Shi QIU , Yukui ZHOU , Risheng LI

材料科学技术(英文)

A molecular dynamics simulation has been used to study zero-fluence and low-bombarding-energy 63Cu-65Cu sputtering. Calculations show that the isotopic ratios at both θ≤35° and θ>35°, and the total isotopic ratio increase when the bombarding energy decreases. This result might imply the existence of the bombarding-energy-dependent momentum asymmetry.

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