Z.Y. Lu 1)
,
S.M.An 2)
,
B.H.Cuo 2)
,
W.M.Li 1)
,
Y.Mei
,
Y.L.Xia 2) and J.Xu 2) 1) Department of Mechanical Engineering
,
Yangzhou University
,
Yangzhou 225009
,
China 2) Dalian University of Technology
,
Dalian 116024
,
China
金属学报(英文版)
This study raised a new assisted technique used for chemical vapor deposition (CVD) in which a laser beam irradiated the surface of substrate and simultaneously the plasma surroundings created in the reactive room, but both laser and plasma were at lower energy level in order to perform easily. The ...
关键词:
CVD
,
null
,
null
,
null