Jinghua YIN
,
Meicheng LI
,
Yufeng ZHENG
,
Zhong WANG
,
Wei CAI
,
Peilin WANG
,
Peilin WANG
材料科学技术（英文）
The effect of annealing temperature on the formation of the PtSi phase. distribution of silicides and the surface morphologies of silicides films is investigated by XPS. AFM. It is shown that the phase sequences of the films change from Pt-Pt2Si-PtSi-Si to Pt+Pt2Si+PtSi-PtSi-Si or Pt+Pt2Si+PtSi-PtSi-st with an increase of annealing temperature and the reason for the formation of mixed layers is discussed.
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