Hao DU
,
Jun GONG
,
Chao SUN
,
Rongfang HUANG
,
Lishi WEN
,
W.Y.Cheung
,
S.P.Wong
材料科学技术（英文）
In this work, the prerequisite and mode of electromagnetic response of Al nanofilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency---film thickness relation as well. Similarity of both plasma frequency---film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms.
关键词:
Aluminum nanofilm
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