REN Jianshi
,
ZHANG Gongshu Institute of Metal Research
,
Academia Sinica.Shenyang
,
China WANG Zhenshu
,
LIU Gen
,
LIU Shenglin Shanghai University of Technology
,
Shengyang
,
China
金属学报(英文版)
Investigation was made of the sputtering rate in glow discharge lamp with relaion to constituent of 25 different specimens of 6 binary systems.namely,Cr-Fe,Bi-Sb,Cu-Zn, Ag-Cu,Al-Zn and Cd-Sn.by measuring mass loss sfter each sputtering under constant Ar pressure and voltage applicd.The correlation.in general,between sputtering rate and concentration of constituent of these non-intermetallic binary alloys obeys the hyperbolic law under steady state,that may be approximately regarded as linear correlation only on certain special condition if the two components of the alloys with similar sputte ringrates.
关键词:
eathode sputtering
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