材料期刊网

THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

X. Y. Jiang , H.B. Xu and S.K. Gong (Department of Materials Science and Engineering , Beijing University of Aeronautics and Astronautics , Beijing 100083 , China)

金属学报(英文版)

The crystallization kinetics of an amorphous Ti-rich NiTi film (Ni 46.34at.%, Ti 53.66at.%)prepared by DC magnetron sputtering was determined by non-isothermal techniques. The activation energy of crystallization and the mean value of the Avrami parameter are 382kJ/mol and 0.85, respectively. The calculated isothermal kinetic curse of amorphous film at 773K coincides with the result of X-ray diffraction.The formation of a Ti2Ni phase is accompanied with the crystallization of Ti-rich NiTi film.

关键词: amorphous NiTi film , null , null