S.Q.Wang1
,
2) and H.Q.Ye1) 1) Laboratory of Atomic Imaging of Solids
,
Institute of Metal Research
,
The Chinese Academy of Sciences
,
Shenyang 110015
,
China 2)Department of Materials Science and Metallurgy
,
University of Cambridge
,
Cambridge CB2 3QZ
,
UK
金属学报(英文版)
Apeculiar crystal defect was observed by experiment of high resolution electron microscopy( HREM) .It wasidentifiedtoformed bytwothreading dislocationsand asegmentof(11 20) domain boundary. An atomicstructure model was proposed for the anomalous defect. Theresultofthe weak beam experimentofelectron microscopeaffirmedthesuggested model.Thestructuralpropertiesofseveral GaN(11 2 0) domain boundaries werestudied by Molec ular Dynamicscalculations. Thetheoreticalresultsshowedthatthelike atom bonding domain boundary, whichcomposesthe main partofthe peculiar defect, has much higher formationenergy than itcounterpartof unlike atom bonding domain boundary. Theoutcome providesanotherevidenceforthesuggested model.
关键词:
HREM
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null
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null
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null
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null
詹倩
,
于荣
,
贺连龙
,
李斗星
,
郭晓楠
金属学报
doi:10.3321/j.issn:0412-1961.2001.04.001
成功地制备了TiO2-Ag-TiO2-SiO超薄多层膜的截面样品,并对其微观结构进行TEM,HREM及纳米束EDS分析.结果表明,薄膜各层厚度均匀,界面明锐、光滑.Ag层由纳米晶组成,而TiO2和SiO层为非晶.Ag在膜层中没有扩散或聚团,这也正是保证整个薄膜性能指标的一个重要因素.
关键词:
低辐射薄膜
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微观结构
,
HREM
,
纳米束分析
詹倩
,
于荣
,
贺连龙
,
李斗星
,
郭晓楠
金属学报
成功地制备了TiO2-Ag-TiO2-SiO超薄多层膜的截面样品,并对其微观结构进行TEM,HREM及纳米束EDS分析.结果表明,薄膜各层厚度均匀,界面明锐、光滑.Ag层由纳米晶组成,而TiO2和SiO层为非晶.Ag在膜层中没有扩散或聚团,这也正是保证整个薄膜性能指标的一个重要因素.
关键词:
低辐射薄膜
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null
,
null
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null
B.L. Li
,
H.M. Du
,
X.F. Wang
,
E.Y. Jiang
金属学报(英文版)
Fe-N thin films were fabricated on both 100Si and NaCl substrates by RF magnetron sputtering under low nitrogen partial pressure. The microstructure and magnetic properties of Fe-N thin films were investigated with the increase of the substrate temperature (Ts) and the annealing temperature (Ta). It is more difficult for nitrogen atoms to enter the Fe lattice under higher Ts above 150℃. The phase evolution is visible at higher Ta above 200℃. The phase transformation of α''-Fe16N2 occurred at 400℃. The change of crystal size with Ta was clearly visible from bright and dark field images. The clear high-resolution electron microscope (HREM) images of 110α, 111γ', 112α'', and 200α'' phases were observed. The interplanar distances from TEM and HREM match the calculated values very well. From the results of the vibrating sample magnetometer (VSM), the good magnetic properties of Fe-N films were obtained at 150℃ of Ts and 200℃ of Ta, respectively.
关键词:
Fe-N thin film
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null
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null
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