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In Situ Scanning-Tunneling-Microscope Observation on Dissolution of a Cu-20Zr Film

Haibo LU

材料科学技术(英文)

A nanocrystalline coating of Cu-20Zr (in wt~pct) was obtained on glass by magnetron sputtering. The corrosion behavior of the Cu-20Zr film in 0.001 mol/L HCl solution was investigated using potentiodynamic polarization and in situ electrochemical scanning-tunneling-microscopy (ECSTM). Results demonstrated that the film exhibits active behavior. Microscopic pitting corrosion and tunneling are caused by localized electrodissolution of Zr atoms and the diffusion of Cu atoms at surface defects.

关键词: Magnetron sputtering , null , null , null

Effect of Thickness on the Structure and Tribological Properties of MoSx Coating

Jihui WANG , E.Wieers , L.M.Stals , J.P.Celis

材料科学技术(英文)

MoSx coatings were prepared by bipolar-pulse DC unbalanced magnetron-sputtering system with the variation of coating thickness at different Ar pressures. The composition and surface morphology were determined by using energy dispersive X-ray and scanning electron microscopy; the structural characterisation was analyzed by X-ray diffraction. The friction and wear properties were investigated by fretting tests in air with less than 10% and 50% relative humidity.At 0.40 Pa pressure, (002) basal plane orientation was formed throughout the coatings. At 0.88 Pa and 1.60 Pa pressures, (002) basal plane orientation was only noticed in the first stage of coating growth (around 0.20 µm in thickness), and then edge orientations with their basal planes perpendicular to the surface would be evolved in the coatings. Humidity has a minor influence on the coatings that have (002) basal plane orientation, whereas the tribological properties of MoSx coatings with edge orientations are greatly affected by humidity. The mechanisms of coating growth and friction and wear processes are discussed.

关键词: MoSx coating , null , null , null

AlN薄膜制备及光学性能研究

席忠红 , 李海翼

低温物理学报

采用直流磁控溅射的方法,分别在Si(111)和玻璃基片上沉积A1N薄膜.利用X射线衍射仪、X射线能谱仪、台阶仪、原子力显微镜、分光光度计和傅里叶变换红外光谱仪等分析薄膜的结构、组分、膜厚、形貌和光学性能.实验得到的样品为多晶六方相AlN,膜厚为720nm,含有少量的氧杂质.对A1N薄膜的光学性能的研究表明,样品在250-1000nm波长范围内具有较高的透过率;红外吸收谱以672cm。为中心形成一个很宽的红外吸收带;薄膜的禁带宽度约为5.94eV.

关键词: AlN薄膜 , 磁控溅射 , 光学性能 , 禁带宽度

Ti6Al4V表面磁控溅射NiCoCrAlY涂层的组织及性能

王宝云 , 李争显 , 严鹏 , 王彦峰 , 姬寿长

表面技术 doi:10.3969/j.issn.1001-3660.2010.01.008

为了提高钛合金的高温抗氧化能力,采用非平衡磁控溅射技术在Ti6Al4V钛合金的表面沉积了NiCoCrAlY涂层,通过SEM,EDS和XRD分析了涂层氧化前后的物相组成和组织形貌.结果表明:长时间沉积后,受基材原始表面状态和涂层择优生长作用的影响,涂层表面有大量微米级的细小颗粒和少量直径约10 μm的圆丘形突起;NiCoCrAlY涂层成分与靶材相近.NiCoCrAlY涂层明显提高了钛合金的抗氧化性能,使其氧化增重速率大大降低.经高温氧化后,涂层与基底的界面处Ti,Ni等元素发生互扩散形成过渡层,随氧化时间延长,过渡层逐渐增厚;并且受高温作用,涂层表面化合物相晶态特征有增强的趋势.

关键词: 钛合金 , 抗氧化 , 磁控溅射 , MCrAlY , 涂层

反应磁控溅射碳化铪薄膜的微结构与力学性能

许辉 , 祝新发 , 张晶晶 , 周颐辛 , 李冠群 , 李戈扬

表面技术 doi:10.3969/j.issn.1001-3660.2010.01.002

为满足不同加工方式和加工条件下刀具对涂层的特殊要求,获得硬度高和耐摩擦性能优异的刀具涂层,采用反应磁控溅射方法制备了一系列不同碳含量的碳化铪薄膜.利用EDX,XRD,SEM,AFM和微力学探针表征了薄膜的微结构和力学性能,研究了C_2H_2分压(Ar和C_2H_2混合气体)对薄膜成分、相组成、微结构以及硬度和弹性模量的影响.结果表明,反应磁控溅射可以方便地制备碳化铪薄膜,但是,只有在C_2H_2分压为混合气体总压约3.0%附近很窄的范围内才可获得高硬度和高弹性模量的单相碳化铪薄膜,其最高硬度和弹性模量分别为27.9 GPa和255 GPa;低C_2H_2分压下所得薄膜由金属Hf和HfC两相组成,硬度较低;而过高的C_2H_2分压将导致薄膜形成非晶态,其硬度和弹性模量亦随之降低.

关键词: 碳化铪 , 硬质薄膜 , 微结构 , 力学性能 , 磁控溅射

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