X.P.Lin
,
Y.Dong
,
X.M.Cao
,
Y.Zhang
,
N.J.Gu
,
X.L.Ma
金属学报(英文版)
Habit plane rotation of lath martensite transformation in Fe-Ni-Mn alloy was predicted by means of Displacement Vector Theory. Its surface relief effect was observed and a math model for the quantitative analysis of habit plane rotation of lath martensite transformation was established by means of atomic force microscopy (AFM). The experiment showed that the largest rotation of habit plane of lath martensite transformation predicted by means of Displacement Vector Theory is 13.50°, and it's incompatible with the concept of invariant plane strain (IPS); surface relief of lath martensite revealed no character of IPS, i.e. it exhibited irregular “N”-shaped “surface relief packet”, and “surface relief packet” was composed of layers of several small surface reliefs, the AFM quantitative analysis of habit plane rotation of lath martensite transformation was 11.11°, which was in agreement with the prediction of Displacement Vector Theory (13.50°) and it firmly confirmed the habit plane rotation of lath martensite transformation and the correctness of Displacement Vector Theory.
关键词:
atomic force microscope (AFM)
,
null
,
null
盛澄成
,
徐阳
,
乔辉
,
魏取福
功能材料
doi:10.3969/j.issn.1001-9731.2016.08.015
采用磁控溅射法在涤纶水刺非织造布表面沉积纳米结构Cu单层膜和ZnO/Cu多层膜,利用原子力显微镜(AFM)对薄膜表面形貌进行分析,并利用四探针测试仪和矢量网络分析仪对样品的电学性能进行了测试.结果表明,在ZnO薄膜表面生长的Cu膜比在PET织物表面生长的Cu膜的均匀性、电学性能要好;在Cu镀膜时间相同的情况下,随着ZnO镀膜时间的增加,多层膜ZnO/Cu的电学性能先提高后降低,当ZnO镀膜时间为20 min时,多层膜的电学性能达到最好;在ZnO镀膜时间相同的情况下,随着Cu镀膜时间的增加,多层膜ZnO/Cu的电学性能和织物表面颗粒均匀性经历了先提高、最后趋于稳定的过程,屏蔽效能最大平均值达到56 dB.
关键词:
磁控溅射
,
ZnO/Cu多层膜
,
Cu单层膜
,
原子力显微镜(AFM)
,
电学性能
