万立骏
,
陈宝清
,
郭可信
金属学报
利用横截面电镜样品,对Ni基体磁控溅射离子镀Al膜进行了透射电镜观察。研究了不同工艺条件下镀膜的组织形态,相结构以及相分布。镀覆5min时,在Ni基体和镀Al膜交界处,发现一个Al-Ni系中迄今未见报道的未知相。经电子衍射分析其为体心四方点阵,a=b=0.588nm,c=0.480nm。研究了随时间变化的镀膜组织结构变化情况。
关键词:
磁控溅射
,
ion-plating
,
microstructure
,
plated film
WAN Lijun Dalian Maritime University
,
Dalian
,
Liaoning
,
China CHEN Baoqing Dalian Institute of Technology
,
Dalian
,
Liaoning
,
China GUO Kexin(K.H.KUO) Institute of Metal Research
,
Academia Sinica
,
Shenyang
,
China Institute of Metal and Technology
,
Dalian Maritime University
,
Dalian
,
Liaoning
,
China
金属学报(英文版)
A new phase was found at the interface between Al film and Ni substrate when the time of ion-plating reaches 5 min.It was identified to be body centered tetragonal lattice with the constants a=b=0.588 nm,c=0.480 nm.The variation of microstructure and phases with the ion-plating time were observed.Based on these results,the ion-plating film formation mech- anism has been also discussed.
关键词:
magnetron sputtering
,
null
,
null
,
null
