材料科学技术（英文）
The ultrathin aluminum films with thickness in the range of 2 similar to 60 nm have been deposited by de magnetron sputtering apparatus. Reflectance and transmittance of the obtained samples were measured with a WFZ-900-D4 UV/VIS spectrophotometer. The optical constant (n, k) and permittivity (epsilon', epsilon ") were determined by applying Newton-Simpson recurrent substitution method. The results indicate that the electromagnetic constitutive characteristic of ultrathin aluminum films is a function of thickness and has obvious size effect.
关键词:
resistivity
P.Wu
,
F.P.Wang
,
L.Q.Pan
金属学报(英文版)
Cu films with thickness of 630-1300nm were deposited on glass substrates withoutheating by DC magnetron sputtering in pure Ar gas. Ar pressure was controlled to0.5, 1.0 and 1.5Pa respectively. The target voltage was fixed at 500V but the targetcurrent increased from 200 to 1150mA with Ar pressure increasing. X-ray diffrac-tion, scanning electron microscopy and atomic force microscopy were used to observethe structural characterization of the films. The resistivity of the films was measuredusing four-point probe technique. At all the Ar pressures, the Cu films have mixturecrystalline orientations of [111], [200] and [220] in the direction of the film growth.The film deposited at lower pressure shows more [111] orientation while that depositedat higher pressure has more [220] orientation. The amount of larger grains in the filmprepared at 0.5Pa Ar pressure is slightly less than that prepared at 1. 0Pa and 1.5PaAr pressures. The resistivities of the films prepared at three different Ar pressures rep-resent few differences, about 3-4 times of that of bulk material. Besides the depositionrate increases with Ar pressure because of the increase in target current. The contri-bution of the bombardment of energetic reflected Argon atoms to these phenomena isdiscussed.
关键词:
Cu film
,
null
,
null
,
null
郅晓
,
朱涛
,
任洋
,
李颖
,
赵高扬
功能材料
利用溶胶-凝胶法在玻璃基板上制备了Al/Zn原子掺杂比例为0～0.25的掺铝氧化锌(ZnO∶Al或AZO)薄膜,随后分别将其在空气,氧气和氮气3种不同气氛中退火处理,研究了薄膜的光学、电学与结构方面的性质.X射线衍射分析表明AZO薄膜是具有c轴择优取向的六方纤锌矿结构多晶体;通过紫外-可见光分光计测定表明该薄膜在可见光范围内具有>80%的高透过率,随着铝掺杂比例的增大光学能隙增大且吸收边向短波方向移动.
关键词:
掺铝氧化锌
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溶胶-凝胶
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电阻率
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光学带隙
赵海霞
,
夏金童
,
王双
,
赵庆才
,
赵敬利
,
李允柱
,
刘奉来
电镀与涂饰
以水性丙烯酸树脂为粘结剂,石墨为主要导电填料,配入其他导电填料制备了水性炭系电热涂料.研究了水性丙烯酸树脂添加量、溶剂水的用量、固化温度和导电填料种类对涂层电热性能的影响,并测试了最佳条件所得涂层的使用性能.结果显示,水性丙烯酸树脂与石墨的质量比为5∶5时,涂层在80 V的电压下通电5 min,表面温度可达95℃.溶剂水的添加量宜23％～27％,涂层固化温度宜50℃左右.在所选炭黑、煅后焦、无烟煤、三氧化二铝、二氧化硅和碳化硅这6种填料中,石墨与炭黑复合后所得涂层电热性能最好.当m(水性丙烯酸树脂)∶m(石墨)∶m(炭黑)=5∶4∶1时,40 V电压时涂层表面温度可迅速达到100℃以上,且耐水性、耐热性、硬度和附着力均满足使用要求.
关键词:
水性丙烯酸树脂
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填料
,
石墨
,
炭黑
,
电阻率
,
电热性能
解希玲
,
谭毅
,
李佳艳
,
董伟
,
刘艳娇
,
邹清川
机械工程材料
采用化学腐蚀方法在多晶硅表面制备多孔硅层，通过外吸杂热处理方法进行除杂后对腐蚀不同时间后多孔硅层的形貌、多晶硅少子寿命和电阻率等进行了研究。结果表明：随着腐蚀时间的延长，形成的多孔硅层呈现不同的形貌，多孔壁孔径逐渐变大，少子寿命延长且电阻率增大；腐蚀14min后。多孔硅层局部区域坍塌，孔壁变薄；腐蚀11min时，经850℃吸杂处理的多孔硅层少子寿命和电阻率达到峰值，分别为0．98μs和0．16Ω·cm。
关键词:
多孔硅
,
多晶硅
,
化学腐蚀
,
电阻率
,
少子寿命
朱妮娜
,
林涛
,
甘卫平
,
郭桂全
电镀与涂饰
以双酚A型环氧树脂E-44为粘接相，以QNP1(端叔胺基超支化聚酯复合物)为潜伏性固化剂，采用非等温示差扫描量热法(DSC)研究了E-44/QNP1体系的固化行为，以55%银粉为导电填料，研究了固化反应时间对导电浆料电性能的影响。E-44/QNP1体系在25~200°C范围内的固化反应热力学研究结果表明，固化剂QNP1的最佳用量为25%，并根据Kissinger和Crane方程拟合出固化反应动力学方程；在110°C/20 min最优固化条件下制备的E-44/QNP1导电银浆，其固化膜的电阻率最小，为3.5×10?5?·cm，可以满足硅异质结太阳能电池顶部电网电极银浆的应用要求。
关键词:
导电银浆
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双酚A型环氧树脂
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固化反应动力学
,
电阻率
,
太阳能电池
,
示差扫描量热法
王艳萍
,
苏晓磊
,
屈银虎
,
王俊勃
,
赵凯莉
材料科学与工程学报
doi:10.14136/j.cnki.issn 1673-2812.2015.06.027
本文采用微米级铜粉为导电填料,抗坏血酸为还原剂,聚乙烯吡咯烷酮为分散剂,环氧树脂为基料,聚酰胺树脂为固化剂,制备获得空气中低温固化铜电子浆料.利用X射线衍射仪、金相显微镜、四探针电阻测试仪、粘度测试仪等对电子浆料各性能进行了表征.实验结果表明,当铜粉与有机载体的比例为85:15时,在烘箱中75℃烘干得到的导电铜膜性能最佳,电阻率为3.627×10-3Ω·cm,空隙较少,样品表面较为平整,导电性较稳定.
关键词:
铜电子浆料
,
有氧固化
,
抗氧化
,
电阻率
