任建世
,
张功杼
,
王桢枢
,
刘根
,
刘圣麟
金属学报
在恒定气压和电压条件下,用测量溅射减量的方法,系统研究了Cr—Fe,Bi-Sb,Cu—Zn,Ag—Cu,Al-Zn和Cd—Sn六个系统的25个试样在辉光放电灯中溅射率与组分的关系结果表明;阴极溅射在稳态时,二元合金(不形成金属间化合物)的溅射率与组元浓度的普遍关系是双曲线,只有在某些特殊情况下,两组元的溅射率相差不大时,可以近似看成线性关系。
关键词:
二元合金
,
glow discharge
,
binary alloy
,
sputtering rate
花银群
,
朱爱春
,
陈瑞芳
,
郭立强
功能材料
doi:10.3969/j.issn.1001-9731.2015.04.014
采用直流磁控溅射法,以高纯铝(99．99％)为靶材,高纯氩气(99．999％)为起辉气体,在经机械抛光的单晶 Si 衬底上制备铝纳米颗粒薄膜.利用 X 射线衍射仪(XRD)、光学薄膜测厚仪、扫描电子显微镜(SEM)和四探针测试仪分别测试了铝纳米颗粒薄膜的晶相结构、薄膜厚度、表面形貌及电阻率.XRD 衍射图谱表明此薄膜为面心立方的多晶结构,择优取向为Al(111)晶面.随溅射功率由30 W 增至300 W,铝纳米颗粒薄膜的沉积速率由3．03 nm/min 增加至20．03 nm/min；而随溅射压强由1 Pa 增加至3 Pa,沉积速率由2．95 nm/min 降低到1．66 nm/min.在溅射功率为150 W,溅射压强为1．0 Pa 条件下制备的样品具有良好的晶粒分布.随溅射功率从80 W 增大到160 W,样品电阻率由4．0×10－7Ω· m 逐渐减小到1．9×10－7Ω·m；而随溅射压强从1 Pa 增至3 Pa,样品电阻率由1．9×10－7Ω·m 增加到7．1×10－7Ω·m.
关键词:
直流磁控溅射
,
铝纳米颗粒薄膜
,
沉积速率
,
微结构
,
电阻率
REN Jianshi
,
ZHANG Gongshu Institute of Metal Research
,
Academia Sinica.Shenyang
,
China WANG Zhenshu
,
LIU Gen
,
LIU Shenglin Shanghai University of Technology
,
Shengyang
,
China
金属学报(英文版)
Investigation was made of the sputtering rate in glow discharge lamp with relaion to constituent of 25 different specimens of 6 binary systems.namely,Cr-Fe,Bi-Sb,Cu-Zn, Ag-Cu,Al-Zn and Cd-Sn.by measuring mass loss sfter each sputtering under constant Ar pressure and voltage applicd.The correlation.in general,between sputtering rate and concentration of constituent of these non-intermetallic binary alloys obeys the hyperbolic law under steady state,that may be approximately regarded as linear correlation only on certain special condition if the two components of the alloys with similar sputte ringrates.
关键词:
eathode sputtering
,
null
,
null
,
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